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Ink repellent, negative photosensitive resin composition, partitioning walls, and light emitting element

A technology of photosensitive resin and partition wall, which is applied in the field of ink repellent, can solve the problems of uniform coating of ink, lower ink affinity of openings, difficult removal of negative photosensitive resin composition, etc., and achieve good storage stability , The effect of sufficient storage stability

Active Publication Date: 2017-02-22
ASAHI GLASS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At this time, it is difficult to completely remove the negative photosensitive resin composition from the opening, and there are usually some residues in the opening.
Due to the existence of the residue of the negative photosensitive resin composition, the ink affinity of the opening is reduced, which hinders the uniform application of ink, which is a problem.

Method used

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  • Ink repellent, negative photosensitive resin composition, partitioning walls, and light emitting element
  • Ink repellent, negative photosensitive resin composition, partitioning walls, and light emitting element
  • Ink repellent, negative photosensitive resin composition, partitioning walls, and light emitting element

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0416] Hereinafter, although this invention is demonstrated based on an Example, this invention is not limited to them. Examples 1, 2, 5-8, and Examples 10-16 are examples, and Examples 3, 4, 9, and Examples 17-19 are comparative examples.

[0417] Each measurement was performed by the following method.

[0418] [number average molecular weight (Mn), mass average molecular weight (Mw)]

[0419] The number average molecular weight (Mn) and the mass average molecular weight (Mw) were measured by gel permeation chromatography using polystyrene as a standard substance. As gel permeation chromatography, HPLC-8220GPC (manufactured by Tosoh Corporation) was used. As the column, a column obtained by connecting three Shodex LF-604 pieces was used. As a detector, an RI detector is used. As a standard substance, EasiCalPS1 (manufactured by Polymer Laboratories) was used. Furthermore, when measuring the number average molecular weight and mass average molecular weight, the column was...

example 1

[0463] (Example 1; Synthesis of Polymer (C1-1))

[0464] At 300cm equipped with a mixer 3 3.87 g of compound (cx-11), 13.30 g of compound (cx-21), 4.16 g of compound (cx-31), and 1.28 g of compound (cx-51) were added to a three-necked flask in a separate flask to obtain a hydrolyzable silane compound mixture. Next, 71.1 g of PGME was added to this mixture to prepare a raw material solution.

[0465] 6.30 g of 1% nitric acid aqueous solution was dripped at the obtained raw material solution. After the dropwise addition, it was stirred at 40° C. for 12 hours to obtain a PGME solution of the polymer (C1-1) (polymer (C1-1) concentration: 10% by mass, hereinafter also referred to as “polymer (C1-1) solution".).

[0466] It should be noted that after the completion of the reaction, the components of the reaction solution were measured using gas chromatography, and it was confirmed that each compound used as a raw material was below the detection limit.

[0467] Table 1 shows the...

example 2～4

[0468] (Examples 2-4: Synthesis of polymers (C1-2) and (Cf-1), (Cf-2))

[0469] Except that the raw material composition was set as shown in Table 1, the same procedure as Example 1 was performed, that is, PGME was added to the mixture of each silane compound shown in Table 1 to prepare a raw material solution, and the acid shown in Table 1 was added dropwise thereto. aqueous solution and stirred in the same manner as Example 1 to obtain solutions of polymer (C1-2) and (Cf-1), (Cf-2) (both compound concentration: 10% by mass, each solution is also referred to as "polymerization" hereinafter). Substance (C1-2), (Cf-1), (Cf-2) solution".).

[0470] Table 1 shows the feed amounts and molar ratios of the raw material hydrolyzable silane compounds used in the production of the polymers (C1-2) obtained above and (Cf-1) and (Cf-2). In Table 1, the silane compound means a hydrolyzable silane compound. In addition, the measurement results of the number average molecular weight (Mn), ...

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Abstract

Provided are: an ink repellent with which it is possible to manufacture a photosensitive resin composition capable of forming an opening that has excellent affinity to ink and partitioning walls that have excellent ink repellent properties on the upper surfaces, the photosensitive resin composition containing the ink repellent having adequate storage stability; a negative photosensitive resin composition containing the ink repellent; partitioning walls having excellent ink repellency on the upper surfaces; and an optical element in which an ink is uniformly applied on the opening partitioned by the partitioning walls and dots are precisely formed. The ink repellent imparts ink repellency on the upper surfaces of the partitioning walls that are formed so as to partition a substrate surface into a plurality of compartments for forming dots, wherein the ink repellent has fluorine atom-containing units and blocked isocyanate group-containing units that can generate an isocyanate group as a result of the blocking being removed by heating, and the ink repellent comprises a polymer that has a fluorine atom content of 1-40% by mass.

Description

technical field [0001] The present invention relates to an ink repellent, a negative photosensitive resin composition, a partition wall and an optical element. Background technique [0002] In the production of optical elements such as organic EL (Electro-Luminescence; electroluminescence) elements, a method of pattern printing by an inkjet (IJ) method using an organic layer such as a light emitting layer as dots may be used. In the above-mentioned method, a partition wall is provided along the contour of the dot to be formed, and ink containing an organic layer material is injected into a section (hereinafter also referred to as an "opening") surrounded by the partition wall to perform Drying, heating, etc., thereby forming dots of a desired pattern. [0003] In the above method, in order to prevent the mixing of ink between adjacent dots and uniformly apply ink during dot formation, it is necessary to have ink repellency on the upper surface of the partition wall, and the...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H05B33/22G03F7/004G03F7/075H01L51/50H05B33/12
CPCG03F7/004G03F7/075H05B33/12H05B33/22H10K50/00G03F7/027G03F7/028G03F7/0382
Inventor 山田光太郎
Owner ASAHI GLASS CO LTD
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