Method for preparing hydrophobic SiO2 anti-reflecting film from dodecyl triethoxysilane

A technology of dodecyltriethoxysilane and antireflection film, which is applied in the field of preparing hydrophobic SiO2 antireflection film, can solve the problems such as the decrease of optical performance of the antireflection film, and improve the hydrophobicity and optical stability. Simple and efficient, the effect of improving hydrophobicity

Inactive Publication Date: 2017-03-08
FUJIAN AGRI & FORESTRY UNIV
View PDF3 Cites 6 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The purpose of the present invention is to provide a method to prepare hydrophobic SiO with dodecyltriethoxysilane 2 The method of anti-reflection film improves the hydrophobicity of anti-reflection film and then improves its optical stability, and solves the problem of SiO prepared by sol-gel method in the prior art. 2 AR coating due to SiO 2 The particles contain a large number of hydrophilic groups and hydroxyl groups are easy to absorb polar pollutants such as moisture and plasticizers in the environment, which eventually leads to the degradation of the optical properties of the anti-reflection coating.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for preparing hydrophobic SiO2 anti-reflecting film from dodecyl triethoxysilane
  • Method for preparing hydrophobic SiO2 anti-reflecting film from dodecyl triethoxysilane

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0017] (1) Preparation of hybrid sol: Mix ethyl orthosilicate, dodecyltriethoxysilane, absolute ethanol and ammonia water into a closed glass container at a mass ratio of 14.2:1.88:130:3.6, Stir at 25°C for 12 h, then age at 20°C for 30 days.

[0018] (2) At an ambient humidity of 20%, the dipping-pulling method is used to coat the cleaned substrate at a certain pulling speed, and the obtained film layer is hydrophobic SiO 2 Anti-reflection coating, the pulling speed of the coating is 100 mm / min.

Embodiment 2

[0020] (1) Preparation of hybrid sol: Mix ethyl orthosilicate, dodecyltriethoxysilane, absolute ethanol and ammonia water in a closed glass container at a mass ratio of 13:3.45:130:3.6, Stir at 30°C for 2 h, then age at 25°C for 6 days.

[0021] (2) At an ambient humidity of 20%, the dipping-pulling method is used to coat the cleaned substrate at a certain pulling speed, and the obtained film layer is hydrophobic SiO 2 Anti-reflection coating, the pulling speed of the coating is 150 mm / min.

Embodiment 3

[0023] (1) Preparation of hybrid sol: Mix ethyl orthosilicate, dodecyltriethoxysilane, absolute ethanol and ammonia water into a closed glass container at a mass ratio of 11.12:5.92:130:3.6, Stir at 50°C for 0.5 h, then age at 40°C for 3 days.

[0024] (2) At an ambient humidity of 20%, the dipping-pulling method is used to coat the cleaned substrate at a certain pulling speed, and the obtained film layer is hydrophobic SiO 2 Anti-reflection coating, the pulling speed of the coating is 200 mm / min.

[0025] Table 1 Example SiO 2 Central wavelength and maximum transmittance of AR coating

[0026]

[0027] It can be seen from Table 1 that as the content of dodecyltriethoxysilane increases, the transmittance of the film does not increase, and when the content is 1.88, it still plays an anti-reflection effect.

[0028] from figure 1 It can be found that the contact angle of the unmodified AR coating is 73°. However, SiO was hybridized with dodecyltriethoxysilane and ethyl o...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides a method for preparing a hydrophobic SiO2 anti-reflecting film from dodecyl triethoxysilane. The method comprises the specific steps: mixing ethyl orthosilicate, dodecyl triethoxysilane, anhydrous ethanol and ammonia water according to the mass ratio of (11.0 to 15.6): (1 to 8): (130 to 200): (3.6 to 6), adding the mixture into a closed glass vessel, firstly, carrying out stirring for 0.5 to 12 hours at the temperature of 25 DEG C to 50 DEG C, and then, carrying out aging for 3 to 30 days at the temperature of 20 DEG C to 40 DEG C; and carrying out filming on a cleanly-washed substrate by adopting a dipping-pulling method under the condition that relative ambient humidity is 20% or below, thereby obtaining a film layer, i.e., the hydrophobic SiO2 anti-reflecting film. According to the method, the process is quick and efficient, the hydrophobicity of the anti-reflecting film is improved, and the service life of the anti-reflecting film in optical fields of solar systems and the like is prolonged.

Description

technical field [0001] The invention belongs to the preparation of hydrophobic SiO 2 Anti-reflection film technical field, be specifically related to prepare SiO with a kind of dodecyltriethoxysilane 2 Anti-reflection coating method. Background technique [0002] According to the principle of Fresnel reflection, light passing through two substances with different refractive indices will definitely cause reflection. Reflection reduces the efficiency of optical components in utilizing light, thereby reducing performance. Coating anti-reflection coatings on optical components can effectively reduce the reflection of light and improve the utilization rate of light. SiO prepared by sol-gel method 2 Anti-reflection coatings are currently a research hotspot. Because of their high transmittance, high laser damage threshold and controllable structure, they have been used in optical fields such as high-energy laser systems and solar systems for decades. However, SiO prepared by s...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C03C17/25
CPCC03C17/25C03C2217/213C03C2217/70C03C2218/111
Inventor 张欣向孙盈盈胡星宇杨文斌
Owner FUJIAN AGRI & FORESTRY UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap