Epitaxial-process tail gas treatment device

Abstract

The invention discloses an epitaxial-process tail gas treatment device which comprises a water storage tank (10), a spray tower (1) which communicates with the water storage tank (10) and is used for absorbing waste gas, a negative pressure generator (23) which is connected with an exhaust port of the spray tower (1), and an overflow box (8) in the normal pressure state, wherein the communicating region before the negative pressure generator (23) forms a negative pressure cavity (25), and the communicating region after the negative pressure generator (23) forms an normal pressure cavity (26); the water storage tank (10) is provided with a water inlet (19) for introducing a continuous water flow; the negative pressure cavity (25) communicates with the liquid of the normal pressure cavity (26); a liquid supplementing port of the overflow box (8) communicates with the liquid of the negative pressure cavity (25); and the turbid liquid in the overflow box (8) is discharged from an overflow port (9). The epitaxial-process tail gas treatment device effectively solves the problem that the common water-washing tail gas washing tower can not well treat the tail gas.

Description

Technical field [0001] The present invention relates to the technical field of exhaust gas processing equipment, in particular to an exhaust gas processor of an epitaxial process. Background technique [0002] A large amount of TCS (the chemical formula is SiHCl) is used in the epitaxial furnace EPI for semiconductor wafer manufacturing. 3 ), HCl, H 2 And ppm concentration level PH 3 Or B 2 H 6 Waiting for gas, the actual reaction rate of the process <20%, a large amount of TCS gas will be discharged as process tail gas out of the reaction chamber of the epitaxial furnace. These toxic and harmful gases must be treated by a suitable tail gas processor before they can be discharged into the atmosphere. As TCS reacts with water to form SiO 2 Granular crystals and HCl gas, etc., and HCl can be dissolved in water and be effectively absorbed and treated; plus H 2 It can be vented directly without any treatment, and a very small amount of PH 3 Or B 2 H 6 Waiting to pass through the ex...

AI Technical Summary

Problems solved by technology

[0006] The purpose of the present invention is to provide an epitaxial process tail gas processor, which can effectively solve the problem that the common water-washing tail gas scrubber cannot handle the tail gas well

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