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Compact type vacuum reaction device for chemical vapor deposition (CVD) diamond film

A chemical vapor deposition, diamond film technology, applied in gaseous chemical plating, metal material coating process, coating and other directions, can solve the problems of CVD diamond film deposition, etc., to shorten the furnace cooling time, ensure concentricity, circulation reasonable effect

Active Publication Date: 2017-03-15
HARBIN INST OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to solve the problem of deposition of CVD diamond film on micro-tools under vacuum conditions, and then provide a compact vacuum reaction device for chemical vapor deposition of diamond film

Method used

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  • Compact type vacuum reaction device for chemical vapor deposition (CVD) diamond film
  • Compact type vacuum reaction device for chemical vapor deposition (CVD) diamond film
  • Compact type vacuum reaction device for chemical vapor deposition (CVD) diamond film

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specific Embodiment approach 1

[0023] Specific implementation mode one: as Figure 1 to Figure 7 As shown, a compact vacuum reaction device for chemical vapor deposition of diamond films, which consists of a vacuum gauge 1, a needle valve 2, an upper cover 3, a housing 4, a base 6, a solenoid valve 7, and an infrared thermometer 8 , air guide tube 11, air guide valve 12, stage 9 and three observation windows 5; the three observation windows 5 are respectively observation window one 5-1 and two observation windows two 5-2;

[0024] The upper end and the lower end of the housing 4 are respectively detachably sealed with the upper cover 3 and the base 6, and the housing 4, the upper cover 3 and the base 6 are combined to form a reaction chamber, and the vacuum gauge 1 (by bolts) is fixed on the On the upper surface of the upper cover 3, the detection end of the vacuum gauge 1 is tightly penetrated into the through hole on the upper cover 3 and is arranged in the housing 4 (the vacuum gauge 1 is used to observe...

specific Embodiment approach 2

[0030] Specific implementation mode two: as figure 1 , image 3 , Figure 4 and Figure 7 As shown in the specific embodiment one, a compact vacuum reaction device for chemical vapor deposition of diamond films, the upper cover 3 is composed of a welding upper cover 3-1 and a cold water tank upper cover 3-2, the The welding loam cake 3-1 and the cold water tank loam cake 3-2 are disc-shaped, and the outer diameter of the welding loam cake 3-1 is less than the outer diameter of the cold water trough loam cake 3-2, and the cold water trough loam cake 3-2 is The upper surface of the 3-2 is processed with a plurality of said cold water ring grooves 3-3 concentric with the cold water groove upper cover 3-2, and a gap 1 is arranged on the inner side wall of each cold water ring groove 3-3, each The gaps of two adjacent cold water ring grooves 3-3 are set at a distance of 180°, and the upper surface of the cold water tank loam cake 3-2 is provided with a water tank partition wall ...

specific Embodiment approach 3

[0031] Specific implementation mode three: as figure 1 , image 3 and Figure 4 As shown, a compact vacuum reaction device for chemical vapor deposition of diamond films described in Embodiment 2, the upper surface of the cold water tank upper cover 3-2 is provided with an annular limiting groove-3 near the outer edge -7, the outer peripheral edge of the lower surface of the welded upper cover 3-1 is provided with a convex ring 3-4, and the convex ring 3-4 of the welded upper cover 3-1 is arranged on the top of the cold water tank cover 3-2 In the annular limit groove-3-7, and the inside surface of the convex ring-3-4 of the welding loam cake 3-1 matches with the annular limit groove-3-7 inner side surface of the cold water tank loam cake 3-2 (realize welding Loam cake 3-1 is concentric with cold water tank loam cake 3-2), the groove width of the annular limit groove-3-7 of cold water tank loam cake 3-2 is greater than the protruding ring-3-4 of welding loam cake 3-1 Thickn...

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Abstract

The invention relates to a compact type vacuum reaction device for a chemical vapor deposition (CVD) diamond film and belongs to the technical field of chemical vapor deposition of the diamond film. The compact type vacuum reaction device aims to solve the problem about deposition of the CVD diamond film on a micro-cutter under the vacuum condition. The upper end and the lower end of a shell are detachably and hermetically connected with an upper cover and a pedestal respectively to form a reaction chamber; a vacuum gauge is fixed on the upper cover; the detection end of the vacuum gauge tightly penetrates through the upper cover and is arranged in the shell; a pipeline communicated with an inner cavity of the shell is fixed on the upper cover; a needle valve is fixed on the pipeline of the upper cover and is communicated with the pipeline; an observation window I is fixed at the position of an observation hole I of the upper cover; a plurality of cold water ring grooves are formed in the upper cover; an observation window II is fixed at each of two observation holes II in the side wall of the shell; an electromagnetic valve is fixed at the position of a gas inlet of the pedestal; one end of a gas guide pipe is connected with a gas inlet box and the other end of the gas guide pipe is communicated with the reaction chamber; a gas guide valve is mounted on the gas guide pipe; and an objective table is arranged in the reaction chamber and is fixed on the pedestal. The compact type vacuum reaction device is mainly applied to diamond film deposition on the surface of a deposition piece micro-cutter.

Description

technical field [0001] The invention relates to a vacuum reaction device for chemical vapor deposition of diamond films, belonging to the technical field of chemical vapor deposition of diamond films. Background technique [0002] Chemical vapor deposition (CVD) diamond film is a deposition process that uses the chemical reaction of methane and hydrogen under high temperature conditions to grow a dense diamond film on the substrate by controlling the reaction conditions. During the reaction process, a series of parameters such as the temperature of the hot wire, the ratio and concentration of the gas source can be adjusted to improve the quality of the obtained diamond film. Since no catalyst is involved in the vapor deposition process, the thermal stability of the resulting diamond is closer to that of natural diamond. CVD diamond film also has the advantages of strong impact resistance, good wear resistance, and good economy. At present, depositing CVD diamond film on th...

Claims

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Application Information

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IPC IPC(8): C23C16/455C23C16/27
CPCC23C16/27C23C16/4412C23C16/45563
Inventor 白清顺王永旭赵航余天凯杜云龙张庆春
Owner HARBIN INST OF TECH
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