Preparation method of heterojunction battery

Abstract

The invention discloses a preparation method of a heterojunction battery. The preparation method comprises the steps of placing a material and processing equipment in a closed vacuum environment; cleaning a silicon wafer; performing polishing processing on two surfaces of the silicon wafer; attaching a mask which is used for single-side texturing and prevents corrosion and penetration of a chemical liquid onto one of the two surfaces subjected to polishing processing; performing wet chemical nanowire structure preparation on the silicon wafer with the mask; performing pre-processing on the prepared nanowire structure before cleaning; performing corrosion cleaning processing on a texture surface by reactive ion dry etching; selecting an appropriate chemical cleaning liquid to further remove silicon particles resided on the surfaces of the silicon wafer; performing targeted post-cleaning processing on the silicon wafer with the nanowire structure after the mask is stripped; starting to prepare a heterojunction solar cell on the silicon wafer after cleaning is finished; wrapping the fabricated heterojunction battery with a layer of protection film; and transmitting the battery to a position outside the vacuum environment. The battery is not liable to oxidize during the fabrication process.

Description

technical field [0001] The invention relates to the field of solar cell preparation, more specifically, it relates to a preparation method of a heterojunction cell. Background technique [0002] At present, various high-efficiency photoelectric conversion devices based on P-type or N-type substrates are emerging, especially heterojunction cells (HIT) constructed with hydrogenated amorphous silicon and single crystal silicon substrates due to their excellent photoelectric conversion Efficiency has attracted much research attention. [0003] The Chinese patent with the notification number: CN102779907A discloses a method for preparing a high-efficiency heterojunction battery, including: a. cleaning the silicon wafer; b. polishing the two surfaces of the silicon wafer, so that the two two surfaces to obtain polished topography; c. a mask for single-side texturing that resists chemical liquid corrosion and penetration is attached to one of the two surfaces that have been polish...

AI Technical Summary

Problems solved by technology

[0004] However, there is still a defect in the preparation method of the above-mentioned high-efficiency heterojunction battery: the above-mentioned process is exposed to the air, so the battery is easily oxidized during the production process, forming a natural oxide layer, which adversely affects the battery efficiency

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