Fabrication method of back incident high-reflection thin film system for neodymium glass laser

A neodymium glass, back-incidence technology, applied in the direction of lasers, laser components, phonon exciters, etc., can solve the problems of limited standing wave electric field optimization effect, difficult improvement, large electric field minimum value, etc., to achieve laser damage The effect of high threshold, low standing wave electric field strength, and reflection bandwidth

Active Publication Date: 2017-03-29
TONGJI UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, due to the small amplitude of the standing wave field of the parallel polarization state P, the minimum value of the electric field is relatively large, so the optimization effect of the standing wave electric field is relatively limited.
Since this characteristic is determined by the basic nature of the parallel polarization state P light interacting with matter, choosing a parallel polarization state P light to design a back-incidence high-reflection film has a poor effect on the laser damage threshold and is difficult to improve

Method used

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  • Fabrication method of back incident high-reflection thin film system for neodymium glass laser
  • Fabrication method of back incident high-reflection thin film system for neodymium glass laser
  • Fabrication method of back incident high-reflection thin film system for neodymium glass laser

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Embodiment 1

[0031] Taking the conventional parallel polarization state P-light back-incidence high-reflection film working angle—Brewster’s angle in the resonator configuration of the neodymium glass laser as an example, for the convenience of comparison. Such asfigure 1 shown.

[0032] Preparation:

[0033] 1) Design the vertically polarized S-light AR coating and the vertically polarized S-light back-incidence high-reflection coating at the Brewster angle; the film structure of the vertically polarized S-light AR coating is [substrate|LHL|air], The film structure of the vertically polarized S-light back-lighting high-reflection film is [substrate|L(HL)^15|air]. where L represents a quarter of the optical thickness of the low refractive index material SiO 2 , H represents a quarter of the optical thickness of the high refractive index material HfO 2 , the working wavelength is 1053nm;

[0034] 2) Analyze and optimize the standing wave electric field. By changing the back-incidence hi...

Embodiment 2

[0046] Adopting the back-incidence high-reflection film system for vertically polarized S light proposed by the present invention can also make the resonant cavity configuration of the neodymium glass laser work at any angle other than the Brewster angle, and now take 45° as an example for illustration.

[0047] Preparation:

[0048] 1) Design a vertically polarized S-light AR coating at 45° incidence and a vertically polarized S-light back-incidence high-reflection film; the film structure of the vertically polarized S-light AR coating is [substrate|LHL|air], and the vertical polarization state The film structure of the S-light back-lit high-reflection film is [substrate|L(HL)^15|air]. where L represents a quarter of the optical thickness of the low refractive index material SiO 2 , H represents a quarter of the optical thickness of the high refractive index material HfO 2 , the working wavelength is 1053nm;

[0049] 2) Analyze and optimize the standing wave electric field...

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Abstract

The invention relates to a fabrication method of a back incident high-reflection thin film system for a neodymium glass laser. The fabrication method comprises the steps of employing vertical polarization state S light as a working polarization state and employing a combined film system of an S light anti-reflection film matched with a corresponding angle and a back incident high-reflection film with regard to spectral characteristic required by formation of a resonant cavity of the neodymium glass laser; optimizing minimum standing wave electric field of the back incident high-reflection film in a thin film-substrate interface; and performing normalization on electric field distribution of the anti-reflection film and the back incident high-reflection film, changing the thickness of the anti-reflection film at the maximum standing wave electric field, and further improving a damage threshold. Compared with an existing scheme of parallel polarization state P light back incident high-reflection film, the fabrication method has the advantages of adjustable working angle, wider reflection band, higher laser damage threshold and better stability and error-tolerant rate.

Description

technical field [0001] The invention relates to the field of laser thin films, in particular to a method for preparing a laser thin film capable of meeting the spectral characteristic requirements of a novel side-pumped neodymium glass laser resonator configuration and having a high laser damage threshold. Background technique [0002] The laser system based on compact resonator is a new type of laser with the fastest development and wide application in the world in recent years. The shape of its working substance is cylindrical and lath; and the coupling mode of the pump can be divided into end pump and side pump. Due to the advantages of high efficiency, good mode matching and wavelength matching, the end pumping method has developed rapidly in the world in recent years, has a wide range of uses, and has great market potential. [0003] However, for neodymium glass laser systems, an important problem limiting its development is thermal management. The neodymium glass las...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01S3/17H01S3/06C23C14/30C23C14/10C23C14/08
CPCC23C14/083C23C14/10C23C14/30H01S3/0602H01S3/17
Inventor 程鑫彬宋智董思禹焦宏飞马彬张锦龙王占山
Owner TONGJI UNIV
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