A n-type pert double-sided battery structure suitable for thinning and its preparation method
A bifacial cell and thinning technology, applied in the field of solar cells, can solve the problems of reducing the efficiency of N-type PERT bifacial cells, affecting the development of N-type PERT bifacial cells, limiting cell efficiency, etc. Production process optimization, the effect of reducing the shading area
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[0049] The N-type PERT bifacial battery structure and its preparation method suitable for thinning proposed by the present invention will be further described in detail below in conjunction with the accompanying drawings and specific examples. Advantages and features of the present invention will be apparent from the following description and claims. It should be noted that all the drawings are in very simplified form and use imprecise ratios, which are only used for the purpose of conveniently and clearly assisting in describing the embodiments of the present invention.
[0050] Please refer to figure 2 ,Such as figure 2 As shown, the N-type PERT double-sided battery structure suitable for thinning provided by the embodiment of the present invention includes a silicon wafer substrate 200; A local n++ heavily doped region 208 is selectively formed, a first passivation anti-reflection layer obtained through one process step is formed on the n+ lightly doped layer 204, and a...
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