Photomask structure and coa array substrate
A technology for array substrates and photomasks, applied in the field of photomask structures and COA-type array substrates, can solve the problems of reducing pixel aperture ratio, gas leakage, color filter layer 200 thickness and slope are not easy to control, etc., to achieve improved electrical connection Quality, slope easing, avoiding bad effects
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[0031] In order to further illustrate the technical means adopted by the present invention and its effects, the following describes in detail in conjunction with preferred embodiments of the present invention and accompanying drawings.
[0032] Please also see Figure 4 to Figure 7 , the present invention provides a photomask structure for making color filter layer via holes in a COA-type array substrate, the photomask structure includes a central light-shielding part 1, surrounding the central light-shielding part 1 and connecting with the outer surface of the central light-shielding part 1 The peripheral light-shielding part 3 with the same contour shape, and the ring-shaped hollow slit 5 sandwiched between the peripheral light-shielding part 3 and the central light-shielding part 1 .
[0033] The photomask of the present invention is used together with negative photoresist, and the pattern jointly formed by the central light-shielding part 1 , the hollow slit 5 , and the pe...
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