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44results about How to "Improve electrical connection quality" patented technology

Method of monolithic photo-voltaic module assembly

Method for manufacturing a photovoltaic module (1) comprising: a) providing an electrically conductive substrate, the substrate being provided with a predetermined electrical pattern; b) depositing a solder paste (7) onto the electrically conductive substrate at pre-defined interconnection locations; c) placing a first encapsulant layer (3) provided with a pattern of openings onto the electrically conductive substrate, the pattern of openings corresponding with the locations of the solder paste (7); d) placing back-contact solar cells (4) on the first encapsulant layer so as to have a match of the electrical pattern of the back-contact solar cells with the electrical pattern of the electrically conductive substrate; e) placing a second encapsulant layer (5) on the back-contact solar cells (4), and placing a glass layer (6) on the second encapsulant layer (5); ; f) applying heat and pressure to the components (2, 3, 4, 5, 6, 7) to cause the encapsulant materials to flow and form a monolithic photovoltaic module, characterised by local application of at the interconnection locations utilizing a laser to couple its energy locally into the solar cell from the side of the glass layer, so as to cause the solder paste to reflow between each interconnection location and its respective matching connection location on the back-contact solar cell for establishing electrical interconnection between the back-contact solar cells and the electrically conductive substrate.
Owner:琴科尔普公司

Semiconductor packaging structure and making method thereof

The invention relates to a semiconductor packaging structure comprising a dielectric layer, a metal layer, a plurality of metal posts, semiconductor chips and packaging colloid, wherein the metal is arranged on the dielectric layer and comprises a chip accommodating gasket and a plurality of path lines, each path line comprises a line body, a welded gasket extending to the periphery of the chip accommodating gasket and an opposite path line terminal; each metal post passes through the dielectric layer, one end of each metal post is connected with the chip accommodating gasket and the respective path line terminal, and the other end of the metal post protrudes out of the dielectric layer; the semiconductor chips are arranged on the chip accommodating gasket and electrically connected with the respective welded packets; and the packaging colloid is used for covering the semiconductor chips, welding wires, the metal layer and the dielectric layer. In the semiconductor packaging structure, a chip accommodating side is provided with the path lines with the welded gaskets, so that the welding wires are not too long and are prevented from cross and tightness, and a phenomenon of solder bridge is difficult to generate when the semiconductor packaging structure is welded to a circuit board because the metal posts protrude out of the bottom surface of the dielectric layer. The inventionalso provides a making method of the semiconductor packaging structure.
Owner:SILICONWARE PRECISION IND CO LTD

Photomask structure and method for forming through holes in negative photoresistive pattern, as well as application

The application discloses a photomask structure and a method for forming through holes in a negative photoresistive pattern, as well as application. The photoresistive structure comprises shading parts corresponding to the through holes, each shading part is defined with a central shading region and a peripheral shading region distributed around the central shading region, a plurality of vertically hollowed slits are distributed in an array in the peripheral shading regions in at least one radial direction of the shading parts, and the widths of the slits meet: bn is larger than bn+1, where bnand bn+1 are the widths of two adjacent slits and bn is farther away from the central shading region compared with the slit corresponding to bn+1. According to the photomask structure, the method andthe application, the hollowed slits are formed in the array in the shading parts, so that the exposure of the positions of the through holes is increased; gentle slopes are formed on the edges of thethrough holes, so that the quality of electrical connections between pixel electrodes and signal wires of metal layers of thin film transistors is improved, meanwhile, film breakage of protective layers in a back-end process is reduced, and the quality and the yield of a product is improved.
Owner:TCL CHINA STAR OPTOELECTRONICS TECH CO LTD

Crystal grain structure of light-emitting diode and method for manufacturing bottom electrode of crystal grain structure

The invention discloses a crystal grain structure of light-emitting diode and a method for manufacturing a bottom electrode of the crystal grain structure. The crystal grain structure of the light-emitting diode comprises a substrate, a light-emitting layer, at least one bottom surface electrode, at least one top surface electrode and at least one side surface electrode, wherein the light-emitting layer is formed on the top surface of the substrate; the bottom surface electrode is formed on the bottom surface of the substrate; the top surface electrode is formed on the top surface of the light-emitting layer; and the side surface electrode is formed on the bottom side surface of the substrate. In the method for manufacturing a bottom electrode, the crystal grain structure of the light-emitting diode comprises a substrate, a light-emitting layer, at least one bottom surface electrode, at least one top surface electrode and at least one side surface electrode, wherein the light-emitting layer is formed on the top surface of the substrate; the bottom surface electrode is formed on the bottom surface of the substrate; the top surface electrode is formed on the top surface of the light-emitting layer; and the side surface electrode is formed on the bottom side surface of the substrate. The method for manufacturing the bottom electrode comprises the following steps of: forming a groove with a certain depth on the bottom surface of a substrate of a light-emitting diode wafer; plating a metal film on a bottom surface and inside the groove with a metal plating technology; and cutting the wafer into crystal grains along the groove. The invention has the advantages of improving the electric connection quality between a die bonding adhesive and crystal grains of a light-emitting diode.
Owner:ARIMA OPTOELECTRONICS

Semiconductor packaging structure and making method thereof

The invention relates to a semiconductor packaging structure comprising a dielectric layer, a metal layer, a plurality of metal posts, semiconductor chips and packaging colloid, wherein the metal is arranged on the dielectric layer and comprises a chip accommodating gasket and a plurality of path lines, each path line comprises a line body, a welded gasket extending to the periphery of the chip accommodating gasket and an opposite path line terminal; each metal post passes through the dielectric layer, one end of each metal post is connected with the chip accommodating gasket and the respective path line terminal, and the other end of the metal post protrudes out of the dielectric layer; the semiconductor chips are arranged on the chip accommodating gasket and electrically connected with the respective welded packets; and the packaging colloid is used for covering the semiconductor chips, welding wires, the metal layer and the dielectric layer. In the semiconductor packaging structure, a chip accommodating side is provided with the path lines with the welded gaskets, so that the welding wires are not too long and are prevented from cross and tightness, and a phenomenon of solder bridge is difficult to generate when the semiconductor packaging structure is welded to a circuit board because the metal posts protrude out of the bottom surface of the dielectric layer. The inventionalso provides a making method of the semiconductor packaging structure.
Owner:SILICONWARE PRECISION IND CO LTD
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