Techniques for low- or zero-misaligned vias are disclosed. In one embodiment, a high-
photosensitivity, medium-
photosensitivity, and low-
photosensitivity layer are applied to a substrate and exposed at the same time with use of a multi-tone
mask. After being developed, one layer forms a mold for a first via, one layer forms a mold for a conductive trace and a second via, and one layer forms an overhang over the position for the second via. The molds formed by the photosensitive
layers are filled with
copper and then etched. The overhang prevents the top of the
copper infill below the overhang region from being etched. As such, the region under the overhang forms a pillar or column after
etching, which can be used as a via. Other embodiments are disclosed.