High-purity quartz production device

Abstract

The invention provides a high-purity quartz production device. The high-purity quartz production device comprises a reacting furnace and a tower body, wherein the reacting furnace comprises a hearth, a heat insulation layer, a heat preserving layer and a metallic furnace cover which are arranged from inside to outside; the hearth is provided with at least one hearth air outlet which passes through the heat insulation layer, the heat preserving layer and a furnace seat; furnace top air inlets and furnace top air outlets are formed in the furnace top; the furnace top air outlets are not lower than the furnace top air inlets and are positioned on two sides of the furnace top; the hearth air outlet and the furnace top air outlet are correspondingly connected to a waste gas treating device; the tower body is arranged at the bottom part of the hearth and comprises a tower body bracket which is vertically arranged on the ground, a guide rail which is arranged on one side of the tower body bracket, and a base which is arranged on the guide rail; the base can be driven by a motor to move up and down along the guide rail; a product holder is arranged on the base and can move and rotate on the base through the motor. With the adoption of the production device, the external pollution and the safety treatment of waste gas in the production can be effectively avoided and achieved.

Description

technical field [0001] The invention relates to a production device of high-purity quartz, in particular to a device for producing high-purity quartz by CVD. Background technique [0002] The industrial production technology of quartz glass mainly includes electric melting process, gas refining process, synthetic quartz glass manufacturing process, and high-frequency plasma flame melting process. Among them, synthetic quartz glass technology includes chemical vapor deposition (CVD) process, vapor phase axial deposition (VAD) process, plasma chemical vapor deposition (PCVD) and so on. The CVD process has great advantages over other methods in the production of large-scale and high-purity quartz glass. At present, large-scale and high-purity quartz glass is generally produced by CVD process. [0003] The equipment for producing large-scale and high-purity quartz glass by CVD process is mainly composed of two parts, one part is the reaction furnace that provides a high-tempera...

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Problems solved by technology

[0004] The existing CVD production of high-purity quartz reaction furnaces all adopt a single-layer structure, and the heat-insulating bricks are directly exposed outside, which is easy to accumulate dust and is not easy to clean

Therefore, dust is easy to fall into the products in the furnace during production. Operators need to carry out frequent inspections to pick out the dust impurities in the products in time. The particles that cannot be picked out will directly lead to the scrapping of the products. At the same time, the insulation brick materials are directly exposed to the The interior is not clean and beautiful

The high-temperature heat in the furnace directly dissipates heat through the gap of the blowtorch into the workshop environment, which will cause the indoor temperature to be too high and increase the cost of cooling

It adopts a single-layer structure, and at the same time, in order to maintain the high temperature in the furnace, the exhaust air volume in the furnace is required to be kept very small, so that the hydrogen chloride waste gas and silica dust produced in the reaction furnace can easily overflow into the workshop, which is harmful to personal safety

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