A post-processing method for optical properties of thin-film components based on laser shock waves
A thin-film element and optical performance technology, applied in the field of post-processing of optical thin-film elements, can solve problems such as different degrees of improvement, difficulty in control, poor repeatability, etc., and achieve the effects of improved stability, improved precision, and improved flexibility and controllability
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Embodiment 1
[0029] (1) A 1064nm high-reflection film with a size of φ50×5mm was fabricated by electron beam evaporation, and an infrared Fourier spectrometer with an in-situ reaction cell was used to measure the in-situ infrared spectrum of the thin-film element during the heating process in real time, and the obtained results were obtained due to the heating process. The change characteristics of the transmittance of the optical thin film element caused by the desorption T 0 ;
[0030] (2) Setting the initial incident laser energy E of the pump laser used for laser shock wave processing 0 , the maximum incident laser energy E m and the laser energy increasing gradient ΔE, the selected spot size is 2mm, the overlap rate is 90%, and the scanning area size is 10×10mm; Requirement E 0 and E m Less than the maximum laser energy that prevents damage to the thin film element when the laser shock wave acts; and mark S as less than or equal to (E m -E 0 ) / ΔE is the largest integer; let i=1; ...
Embodiment 2
[0042] (1) A 532nm anti-reflection film with a size of φ30×3mm was fabricated by electron beam evaporation, and an infrared Fourier spectrometer with an in-situ reaction cell was used to measure the in-situ infrared spectrum of the thin film element during the heating process in real time, and the obtained results were obtained due to the heating process. The change characteristics of the transmittance of the optical thin film element caused by the desorption T 0 ;
[0043] (2) Setting the initial incident laser energy E of the pump laser used for laser shock wave processing 0 , the maximum incident laser energy E m and the laser energy increasing gradient ΔE, the selected spot size is 1mm, the overlap rate is 90%, and the scanning area size is 10×10mm; Requirement E 0 and E m Less than the maximum laser energy that prevents damage to the thin film element when the laser shock wave acts; and mark S as less than or equal to (E m -E 0 ) / ΔE is the largest integer; let i=1; ...
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