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Liquid ejection device, nano-imprinting apparatus, nano-imprinting liquid storage tank, method of manufacturing cured product pattern, method of manufacturing optical component, method of manufacturing circuit board, and method of manufacturing imprinting mold

A technology of nanoimprinting and liquid containment, which is applied to the device for coating liquid on the surface, the manufacture of semiconductor/solid-state devices, and the photolithography process of patterned surfaces, etc. It can solve the problems of increasing particles, metal impurities or water concentration, etc.

Inactive Publication Date: 2017-08-29
CANON KK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Therefore, there is a problem that the liquid for nanoimprint accommodated in the accommodation portion increases the concentration of particles, metal impurities, or water in the liquid for nanoimprint over time.

Method used

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  • Liquid ejection device, nano-imprinting apparatus, nano-imprinting liquid storage tank, method of manufacturing cured product pattern, method of manufacturing optical component, method of manufacturing circuit board, and method of manufacturing imprinting mold
  • Liquid ejection device, nano-imprinting apparatus, nano-imprinting liquid storage tank, method of manufacturing cured product pattern, method of manufacturing optical component, method of manufacturing circuit board, and method of manufacturing imprinting mold
  • Liquid ejection device, nano-imprinting apparatus, nano-imprinting liquid storage tank, method of manufacturing cured product pattern, method of manufacturing optical component, method of manufacturing circuit board, and method of manufacturing imprinting mold

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Experimental program
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Effect test

Embodiment approach

[0223] The device 1 applicable to the nanoimprint apparatus is described in the above-described embodiments. The invention is not limited to the device 1 . That is, the unit 4 that can be mounted to the device 1 is included in the present invention. The following devices are also included in the present invention: a nanoimprint device that can mount the device 1 and form a resin pattern having a predetermined shape on a substrate by the above-mentioned photonanoimprint process.

[0224] Figure 6 is a schematic diagram of a nanoimprint apparatus 600 according to an embodiment of the present invention. The nanoimprint apparatus 600 performs an optical nanoimprint process in such a way that the liquid 9 placed on the substrate 6 is shaped with a mold 104 and then solidified, the mold 104 is separated from the solidified liquid 9, and the pattern is thereby transferred to the substrate 6 equipment. The details of the photonanoimprint process are as described above.

[0225] ...

Embodiment 1

[0234] First, the component (A), component (B), and additive component (C) are blended together below. The blend was filtered through a 0.2 μm mesh filter made of ultra-high molecular weight polyethylene, whereby a photocurable composition a was obtained.

[0235] (1-1) Component (A): 94 parts by weight in total

[0236] (A-1) Isobornyl Acrylate (IB-XA TM , manufactured by Kyoeisha Chemical Co., Ltd.): 9.0 parts by weight

[0237] (A-2) Benzyl Acrylate (V#160 TM , manufactured): 38.0 parts by weight

[0238] (A-3) Neopentyl glycol diacrylate (NP-A TM , manufactured by Kyoeisha Chemical Co., Ltd.): 47.0 parts by weight

[0239] (1-2) Component (B): 3.5 parts by weight in total

[0240] (B-1) Lucirin TPO (manufactured by BASF): 3 parts by weight

[0241] (B-2) 4,4'-bis(diethylamino)benzophenone (manufactured by Tokyo Chemical Industry Co., Ltd.): 0.5 parts by weight

[0242] (1-3) Additive component (C): 1.6 parts by weight

[0243] (C-1) Polyoxyethylene stearyl ether S...

Embodiment 2

[0249]After the photocurable composition a was prepared in the same manner as described in Example 1, 100 ml of the photocurable composition a was measured and then charged into a bottle made of PFA having a volume of about 100 mL. Thereafter, the adsorption medium (p-2) was charged into the bottle containing the photocurable composition a. In this example, the adsorption medium (p-2) used was a Zeta Plus (registered trademark) EC series filter, B47-020GN (diameter of about 47 mm and thickness of about 3 mm, manufactured by 3M Japan Limited). The sorption medium (p-2) is made of cellulose, diatomaceous earth and ion exchange resin.

[0250] The sorption medium (p-2) was bottled and allowed to stand for one month. Thereafter, each metal element (17 kinds of elements: Na, Ca, Fe, K, Zn, Al, Mg, Ni, Cr, Cu, Pb, Mn, Li, Sn, Ba, The contents of Co and Sr) were measured using an ICP emission spectrometer CIROS CCD (manufactured by SPECTRO). In addition, metal elements were simila...

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Abstract

A liquid ejection device includes a storage section storing a nano-imprinting liquid and also includes an ejection port which communicates with the storage section and which ejects the nano-imprinting liquid. The storage section contains a sorption medium that adsorbs or absorbs at least one selected from the group consisting of particles, metal ions, and water. The sorption medium is not ejected from the ejection port when the nano-imprinting liquid is ejected from the ejection port.

Description

technical field [0001] The present invention relates to a liquid discharge device that discharges a liquid for nanoimprinting, a nanoimprint device, a liquid storage tank for nanoimprinting, a method for manufacturing a pattern of a cured product using the liquid discharge device, a method for manufacturing an optical component, A method of manufacturing a circuit board, and a method of manufacturing a mold for imprinting. Background technique [0002] In semiconductor devices, microelectromechanical systems (MEMS), and the like, demands for microfabrication have been increasing. In particular, photonanoimprint technology has drawn attention. [0003] In the photonanoimprint technique, a photocurable composition (resist) is cured in such a state that a mold having a fine uneven pattern on its surface is pressed against a substrate (wafer) coated with the photocurable composition. This transfers the concavo-convex pattern of the mold to the cured product of the photocurable...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/027B05C5/00B05D1/26B05D3/06B29C59/02B05C11/10
CPCB82Y10/00G03F7/0002B05C5/02B05D1/26B05D3/06B05C11/10B05C5/00G03F7/00
Inventor 伊藤俊树荒木義雅岩下和美
Owner CANON KK