A pattern writing method based on a large-area super-resolution laser direct writing system

Abstract

The invention provides a graph writing method based on a large-area super-resolution laser direct-writing system. A source graphic file is subjected to clockwise or anticlockwise rotation at a certain angle, and cut and corrected along a periodical border; then multiple cut and numbered single-frame written graphs are output for integrating difference of writing effects in a scanning direction and a stepping direction, so that the finally written large-area micro-nano structure has high uniformity in both X / Y directions of a Cartesian coordinate system, and the writing quality and rate of finished products of the raster scanning stepping type laser direct-writing system on multiple kinds of materials are greatly improved; and by virtue of the graph writing method, the successful rate and accuracy of the laser direct-writing system in device preparation and material research are remarkably improved.

Description

technical field [0001] The invention relates to the field of laser direct writing, and more specifically, to a pattern writing method based on a large-area super-resolution laser direct writing system. Background technique [0002] Laser direct writing is to use variable intensity laser beams to implement variable dose exposure on the resist material on the surface of the substrate, and form the required relief profile on the resist layer surface after development. The basic working principle of laser direct writing is that the computer controls high-precision laser beam scanning, and directly exposes and writes any designed graphics on the photoresist, so that the designed graphics are directly transferred to the mask. [0003] Laser direct writing technology plays an important role in the manufacturing process of semiconductor devices, optoelectronic devices and microelectromechanical devices. There are three mainstream laser direct writing micro-nano processing methods: e...

AI Technical Summary

Problems solved by technology

[0005] The present invention provides a graphic writing method based on a large-area super-resolution laser direct writing system that overcomes the above problems or at least partially solves the above problems, and solves the "smearing effect" caused by high-speed scanning in the prior art, and the scanning axis and step The difference in the writing effect of the scanning direction and the stepping direction is caused by the speed difference of the feed axis and the splicing between frames.

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