Substrate wet process process method and substrate wet process process device

Abstract

The invention discloses a substrate wet process technological method, and aims to solve the technical problem of potential damage in the substrate processing process in the existing wet etching process. The technological method comprises the steps of setting a bearing platform and fixing a substrate through the bearing platform; moving the bearing platform along a circumferential track to convey the substrate; setting processing equipment along the outer side of the circumferential track; and in the substrate conveying process, adjusting the orientation and / or height of the substrate by the bearing platform to be matched with the processing equipment. The moving technological beat of the bearing platform along the circumferential track is controlled by an annular conveyor belt, so that consumed resource, manpower, time and other maintenance cost in replacing a huge number of rolling wheels periodically can be saved; the etching process and cleaning technological method are further improved; the jetting direction of the medicinal liquid and net water flow is changed; etching rate and medicinal liquid take-out amount are controlled effectively; and the cost is lowered while the etching quality can be effectively ensured. The invention also provides a substrate wet process technological apparatus.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a substrate wet process process method and a wet process process device. Background technique [0002] The devices used in the existing substrate wet process method usually use sequentially arranged rollers (ie, rollers) on the conveyor belt to carry the glass substrate to complete the transportation of the substrate between processes. It takes time and effort to maintain a large number of rollers, and any single point of failure will cause damage to the substrate, forming scratches or fragments, resulting in a decrease in the etching yield. However, the conveyor belt as an infrastructure is expensive, and large-scale periodic replacement of rollers consumes a lot of maintenance costs. Contents of the invention [0003] In view of this, the embodiments of the present invention provide a substrate wet process process method and a wet process process device, which are used to s...

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Problems solved by technology

[0003] In view of this, the embodiment of the present invention provides a substrate wet process process method and a wet process process device, which are used to solve the technical problem of reduced etching yield in the existing wet etching process

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