Activation method for improving stability of gallium arsenide photocathode
A photocathode and stability technology, which is applied in the manufacture of light-emitting cathodes, can solve the unsatisfactory stability of GaAs photocathode and other problems, and achieve the effect of good activation method, easy promotion, and few operation steps
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Embodiment 1
[0032] The activation process is as follows figure 1 shown.
[0033] Before cesium oxygen activation, we chemically clean and high-temperature purify the GaAs photocathode material.
[0034] The step of chemical cleaning is to first use H with a ratio of 4:1:100 2 SO 4 :H 2 o 2 :H 2 O mixed solution was chemically etched for 1 minute, and then put into HCl:H with a ratio of 1:1 2 O mixed solution was etched for 2 minutes, and finally the sample was repeatedly rinsed with deionized water and dried.
[0035] The step of high temperature purification is to send the sample to a vacuum degree not lower than 10 -7 In the ultra-high vacuum system of the order of Pa, the heating temperature is 650°C and the heating time is 20 minutes. After the sample is naturally cooled to room temperature, the sample is sent to the activation position, and the cesium oxygen activation starts.
[0036] When activated, a tungsten-halogen lamp is used to irradiate the cathode surface verticall...
Embodiment 2
[0043] An activation method for improving the stability of gallium arsenide photocathode, comprising cesium source activation and oxygen source activation, the specific steps are as follows:
[0044] Step 1. Perform chemical cleaning and high-temperature purification on the sample to be activated;
[0045] The chemical cleaning method is as follows: first use H with a ratio of 4:1:100 2 SO 4 :H 2 o 2 :H 2 O mixed solution for chemical etching; then put in HCl:H with a ratio of 1:1 2 O mixed solution was etched, and finally the sample was rinsed with deionized water for at least one minute.
[0046] The high-temperature purification step is: put the sample after chemical cleaning into the ultra-high vacuum system for 30 minutes of heating, the heating temperature is 550°C, and the vacuum degree of the ultra-high vacuum system is not lower than 10 -7 Pa order of magnitude.
[0047] Step 2. Turn on the cesium source, the photocurrent gradually increases, and the photocurre...
Embodiment 3
[0054] An activation method for improving the stability of gallium arsenide photocathode, comprising cesium source activation and oxygen source activation, the specific steps are as follows:
[0055] Step 1. Perform chemical cleaning and high-temperature purification on the sample to be activated;
[0056] The chemical cleaning method is as follows: first use H with a ratio of 4:1:100 2 SO 4 :H 2 o 2 :H 2 O mixed solution for chemical etching; then put in HCl:H with a ratio of 1:1 2 O mixed solution was etched, and finally the sample was rinsed with deionized water for at least one minute.
[0057] The high-temperature purification step is: put the sample after chemical cleaning into the ultra-high vacuum system for 10 minutes of heating, the heating temperature is 650°C, and the vacuum degree of the ultra-high vacuum system is not lower than 10 -7 Pa order of magnitude.
[0058] Step 2. Turn on the cesium source, the photocurrent gradually increases, and the photocurre...
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