Doped ultra-low expansion glass and methods for making the same

A glass product and glass technology, which is applied to doped ultra-low expansion glass and its field, can solve problems such as difficulty in achieving specifications

Inactive Publication Date: 2017-10-13
CORNING INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

As a result, specifications for materials used in these optical systems, including CTE and expansion criteria, are becoming increasingly difficult to achieve

Method used

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  • Doped ultra-low expansion glass and methods for making the same
  • Doped ultra-low expansion glass and methods for making the same
  • Doped ultra-low expansion glass and methods for making the same

Examples

Experimental program
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Effect test

Embodiment 1

[0059] by separate flame hydrolysis of TiCl 4 and SiCl 4 Titanium dioxide and silica soot particles were fabricated and the soot was deposited on a lathe bait rod using an OVD process for approximately 16.5 hours. The soot body thus produced had a mass of 6010 g, a density of 0.43 g / cc and a diameter of 135.2 mm. The soot body was then consolidated in a muffle furnace as follows: heating to 1125° C. for 60 minutes in flowing He (5 slpm—standard liters per minute). Then, by passing 0.15slpm Cl in the furnace 2 gas and 5 slpm He, at 1125°C for an additional 120 minutes to dry the soot body. Next, by flowing 4.96 slpm He, 0.04 slpm O at 1125°C 2 and 0.75slpm SiF 4 , flow for 40 min to purge Cl. Finally, with 4.96slpm He, 0.04slpm O 2 and 0.75slpm SiF 4 The green bodies were sintered at a peak temperature of 1385° C. and a downward drive speed of 6 mm / min in a muffle furnace to obtain a target F concentration of 1.5 wt % in the glass. Due to TiO 2 The presence of crystal...

Embodiment 2

[0062] by separate flame hydrolysis of TiCl 4 and SiCl 4 Titanium dioxide and silica soot pellets were fabricated and the soot was deposited on a bait rod on a lathe using the OVD process for approximately 16.5 hours. The soot body thus produced had a mass of 5992 g, a density of 0.42 g / cc and a diameter of 135.7 mm. The soot body was then consolidated in a muffle furnace as follows: heating to 1125° C. for 60 minutes in flowing He (5 slpm—standard liters per minute). Then, by passing 0.15slpm Cl in the furnace 2 gas and 5 slpm He, at 1125°C for an additional 120 minutes to dry the soot body. Next, Cl was purged by flowing 5 slpm He at 1125°C for 30 minutes. Finally, with 4.92slpm He, 0.08slpm O 2 and 0.2slpm SiF 4 The green body was sintered at a peak temperature of 1440° C. and a downward drive speed of 6 mm / min in a muffle furnace to obtain a target F concentration of 0.8 wt % in the glass. Due to TiO 2 The presence of crystallites, therefore, the color of the forme...

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Abstract

A doped silica-titania glass article is provided that includes a glass article having a glass composition comprising (i) a silica-titania base glass, (ii) a fluorine dopant, and (iii) a second dopant. The fluorine dopant has a concentration of fluorine of up to 5 wt. % and the second dopant comprises one or more oxides selected from the group consisting of Al, Nb, Ta, B, Na, K, Mg, Ca and Li oxides at a total oxide concentration from 50 ppm to 6 wt.%. Further, the glass article has an expansivity slope of less than 0.5 ppb/K2 at 20DEG C. The second dopant can be optional. The composition of the glass article may also contain an OH concentration of less than 100 ppm.

Description

[0001] This application claims the benefit of priority under 35 U.S.C. §119 to U.S. Provisional Application Serial No. 62 / 091,152, filed December 12, 2014, which application is based upon and is hereby incorporated by reference in its entirety. Background technique [0002] The present disclosure relates to doped, ultra-low expansion ("ULE") glasses, glass articles and methods for making the same, including doped silica-titania ULE glass systems. [0003] Extreme Ultraviolet Lithography (“EUVL”) is an emerging / leading lithography technology targeting the 13nm node and beyond to fabricate Micro Processing Unit (“MPU”) and Dynamic Random Access Memory (“DRAM”) chips. EUVL scanners used to produce MPUs, DRAMs and other integrated chips are currently being produced in small quantities to demonstrate the technology. Projection optics, especially reflective optics, are an important part of these scanners. Low thermal expansion glass, e.g. (Corning) Corporation's Glass is curren...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C3/06C03B19/14C03B25/02
CPCC03B19/1453C03B19/1461C03B25/02C03B2201/075C03B2201/12C03B2201/14C03B2201/23C03B2201/32C03B2201/40C03B2201/42C03B2201/50C03B2201/54C03C3/06C03C2201/12C03C2201/14C03C2201/32C03C2201/40C03C2201/42C03C2201/50C03C2201/54C03C2203/52C03C3/112C03C4/00C03B2201/07
Inventor S·安纳马莱C·A·杜兰K·E·贺迪纳
Owner CORNING INC
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