How to use the automatic target changer

Abstract

The invention discloses an automatic target replacing device. The automatic target replacing device is applied to an electron beam evaporation deposition device. A use method of the automatic target replacing device comprises the following steps that (1) a target material is fed in real time, wherein when the evaporation deposition technology is conducted, according to data of a second sensor, a control unit of a feeding mechanism automatically controls a second servo motor in real time to drive a feeding platform to upwards feed target materials in a target container in real time according to the consumption of the evaporation deposition technology; (2) the target material is automatically replaced, wherein a third servo motor drives a target material disk to rotate, a second target material cavity, provided with the target material, on the target material disk is rotated to the position under the target container to accurately coincided with a cylindrical cavity of the target container, the feeding platform moves upwards to be under the target material of the second target material cavity and supports the target material, then a clamping door is opened, the feeding platform continues moving upwards to feed the target material into the target container and is tightly combined with the target material in the target container, and then the feeding mechanism is stopped; and (3) a replacement target material is pushed into the target material disk.

Description

technical field [0001] The invention belongs to the technical field of machinery, and in particular relates to a method for using an automatic target changing device. Background technique [0002] Thin film technology has been widely used in industry, especially in the fields of electronic materials, magnetic materials and components industry. Therefore, the methods of preparing thin films with various properties have also made great leaps in recent decades. develop. [0003] Existing electron beam evaporation equipment generally needs to open the vacuum coating chamber to replace the target when one target is used up, but in a large number of applications, the target needs to be replaced frequently, because the opening and vacuuming of the vacuum chamber require a certain amount of time. The time will increase the time cost, which will affect the efficiency of evaporation, which is not conducive to mass production; and the frequent use of the molecular pump will reduce its...

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Problems solved by technology

[0003] Existing electron beam evaporation equipment generally needs to open the vacuum coating chamber to replace the target when one target is used up, but in a large number of applications, the target needs to be replaced frequently, because the opening and vacuuming of the vacuum chamber require a certain amount of time. The time will increase the time cost, which will affect the efficiency of evaporation, which is not conducive to mass production; and the frequent use of the molecular pump will reduce its life; at the same time, frequent opening of the vacuum chamber will cause dust and other impurities to enter the vacuum Chamber, which affects the quality of vacuum coating

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