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Free radical-positive ion mixed type photo cured system and applications thereof

A light-curing, hybrid technology, applied in applications, optics, household appliances, etc., can solve the problems of high price, poor absorption of LED light source, inability to cure or incomplete curing, etc.

Active Publication Date: 2017-11-07
CHANGZHOU TRONLY NEW ELECTRONICS MATERIALS +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, most of the existing light-curing systems have poor absorption capacity for LED light sources, and often cannot be cured or are incompletely cured. A few applicable systems have more restrictions on the types of components and are expensive

Method used

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  • Free radical-positive ion mixed type photo cured system and applications thereof
  • Free radical-positive ion mixed type photo cured system and applications thereof
  • Free radical-positive ion mixed type photo cured system and applications thereof

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preparation example Construction

[0091]

[0092] The photocurable composition of the present invention can be obtained by weighing each component according to the amount and mixing them uniformly.

[0093] At present, commercially available products in the field of light curing, especially mid-to-high-end products, are mainly imported. Most of these products have patented technology and high product prices. However, domestic companies lack core technologies and independent intellectual property rights. Under strict technical barriers, enterprise development is difficult. Even the R&D layout has been greatly restricted. Through the optimization of the components, the hybrid photocurable composition obtained has a large photosensitive wavelength range and good photocuring effect, and can combine the advantages of free radical and cationic photocurable systems, and can be applied in such as paints, coatings, inks, moldings, etc. Materials and other aspects have been applied, with strong technical and market co...

specific Embodiment approach

[0094] The present invention will be described in further detail below in conjunction with specific examples, but they should not be construed as limiting the protection scope of the present invention.

[0095] Unless otherwise specified, the parts described below are all parts by weight. The meaning of each abbreviation is as follows:

[0096] A1:

[0097] A2:

[0098] A3:

[0099] A4:

[0100] B1: trimethylolpropane triacrylate;

[0101] B2: bisphenol A epoxy acrylate resin (SM6105-80);

[0102] B3: 4-hydroxybutyl vinyl ether (HBVE);

[0103] B4: Trimethylolpropane tris(3-ethyl-3-oxetanylmethyl) ether; B5: 3,4-epoxycyclohexylmethyl-3,4-epoxycyclohexylcarboxylic acid ester;

[0104] C1:

[0105] C2:

[0106] D1:

[0107] D2:

[0108] 1. Preparation of photocurable composition

[0109] The photocurable composition was prepared according to the formula shown in Table 1 below.

[0110] Table 1

[0111]

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Abstract

The invention discloses a free radical-positive ion mixed type photo cured composition, which comprises an anthracene ester sensitizer selected from compounds having a structure represented by the formula (I) and / or macromolecular compounds taking the structure represented by the formula (I) as the main structure; positive ion reaction type compounds, free radical reaction type compounds, wherein the two reaction type compounds comprise at least one compound containing unsaturated double bonds and at least one compound containing epoxy groups; a positive ion type photoinitiator; and optionally comprises a free radical type photoinitiator. Through component optimization, the advantages of a free radical photo cured system and a positive ion photo cured system are combined; the photo cured composition can well respond to a light source with a wavelength of 200 to 500 nm; the curing speed is quick, the shrinkage rate is little, the developing property is excellent, the image is complete, moreover, the hardness of cured film is high, and the adhesive force on a basic material is strong.

Description

technical field [0001] The invention belongs to the field of organic photocuring, and in particular relates to a radical-cation hybrid photocuring composition and its application in the field of photocuring. Background technique [0002] UV curing technology is widely used in the fields of electronic material preparation and other fields. According to the different mechanism of initiating polymerization, it can be divided into two categories: free radical type and cationic type. Both have their own advantages and disadvantages. Free radical polymerization has a wide range of raw materials and high formula adjustability, but the curing shrinkage rate is large, which is easy to cause oxygen inhibition; cationic polymerization does not have the problem of shrinkage rate and oxygen inhibition, but the curing speed Slow and expensive. Free radical-cation hybrid photocuring system is considered to be an effective way to combine the advantages of both. However, practice shows tha...

Claims

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Application Information

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IPC IPC(8): C08F283/10C08F222/14C08F216/14C08F2/50C08G59/20C09D163/10C09D11/00
CPCC08F2/50C08F283/105C08G59/20C09D11/00C09D163/10C08F222/103C08F216/1416G03F7/004G03F7/031
Inventor 钱晓春胡春青
Owner CHANGZHOU TRONLY NEW ELECTRONICS MATERIALS
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