Magneto-rheological plane polishing device
A polishing device and magnetorheological technology, which is applied in the field of magnetorheological plane polishing device and ultra-smooth surface processing of microelectronic semiconductor wafers, can solve the problems of unsatisfactory polishing quality, low processing shape precision, and low polishing efficiency. Achieve the effect of improving polishing efficiency and quality, improving efficiency and reducing wear rate
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[0030] Embodiments of the present invention are described in detail below, examples of which are shown in the drawings, wherein the same or similar reference numerals denote the same or similar elements or modules having the same or similar functions throughout. The embodiments described below by referring to the figures are exemplary only for explaining the present invention and should not be construed as limiting the present invention.
[0031] Those skilled in the art will understand that unless otherwise stated, the singular forms "a", "an", "said" and "the" used herein may also include plural forms. It should be further understood that the word "comprising" used in the description of the present invention refers to the presence of said features, integers, steps, operations, elements and / or modules, but does not exclude the presence or addition of one or more other features, Integers, steps, operations, elements, modules, and / or groups thereof.
[0032] Those skilled in t...
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