High-precision interference-type dual phase grating displacement sensor for surface topography measurement

A surface topography measurement and displacement sensor technology, applied in the direction of measuring devices, optical devices, instruments, etc., can solve the problems of complex mechanical structure of double-plane gratings, insufficient optical resolution, and reduced signal quality, and achieve simple structure, The effect of good signal quality and high signal-to-noise ratio

Active Publication Date: 2017-12-01
SUZHOU UNIV
View PDF6 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to propose a high-precision interferometric dual-phase grating displacement sensor for surface topography measurement, to overcome the complex optical path, large structure, insufficient optical resolution and dual-plane grating mechanism of single-cylindrical grating interference displacement sensor. The complex structure and interference fringes have the disadvantages of reducing the signal quality due to the interference of other high-order diffracted light, and have the characteristics of high optical resolution, simple mechanical structure, small size, and high quality interference signal

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • High-precision interference-type dual phase grating displacement sensor for surface topography measurement
  • High-precision interference-type dual phase grating displacement sensor for surface topography measurement
  • High-precision interference-type dual phase grating displacement sensor for surface topography measurement

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0042] The specific implementation manners of the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. The following examples are used to illustrate the present invention, but are not intended to limit the scope of the present invention.

[0043] Refer to attached figure 1 to attach Figure 7 , the high-precision interferometric dual-phase grating displacement sensor used for surface topography measurement in this embodiment includes a laser 11, a polarization 2 and a collimation device 1, a reflective cylindrical holographic phase grating 3, and two symmetrically arranged Plane reflector 7, reference plane grating 8 whose linear density is twice the linear density of reflective cylindrical holographic phase grating 3, two photodetectors 9 arranged symmetrically, two photodetectors connected to the two photodetectors 9 respectively The signal processing device 10 , the measuring lever 4 connected to the re...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a high-precision interference-type dual phase grating displacement sensor for surface topography measurement, which comprises a laser, a reflection-type cylindrical holographic phase grating, two symmetrically-arranged plane reflectors, a reference plane grating with the linear density double that of the reflection-type cylindrical holographic phase grating, two symmetrically-arranged photodetectors, two signal processing devices connected with the two photodetectors respectively, a measurement lever with one end connected with the reflection-type cylindrical holographic phase grating, and a contact pin connected with the other end of the measurement lever and contacted with the surface of a to-be-measured workpiece. The reflection-type cylindrical holographic phase grating generates + / - 1-order diffraction light with a diffraction angle to be theta, the light is reflected by the two plane reflectors and is then incident to the same grating area on the reference plane grating, two groups of different-order diffraction light interference fringes are generated in + / -theta angle directions respectively, the interference fringes are received by the two photodetectors respectively and are converted to electric signals, and the electric signals are transmitted to the signal processing devices for being processed.

Description

technical field [0001] The invention relates to a high-precision interference type double-phase grating displacement sensor for surface topography measurement. Background technique [0002] In surface roughness measurement, the stylus method (also known as Taylor method), as a commonly used contact measurement method, is an internationally recognized standard method for two-dimensional surface topography measurement. The displacement conversion devices used in the stylus method include inductive, grating interferometric, Michelson interferometric, scanning white light interferometric, etc. Among them, the grating interferometric displacement measurement system based on the principle of grating diffraction interference can obtain large range and high resolution at the same time. The displacement measurement system is a very promising method for surface topography measurement. The grating interferometric displacement sensor currently used for surface topography measurement i...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G01B11/24G01B11/02
CPCG01B11/02G01B11/2441
Inventor 陈新荣查杭李朝明吴建宏
Owner SUZHOU UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products