Preparation method of array substrate, array substrate and display device

Abstract

The invention provides a preparation method of an array substrate, the array substrate and a display device. According to the preparation method, exposure of a black matrix material is achieved by lightening a luminous area on the substrate, and thus the exposed black matrix material is developed to obtain a black matrix. The black matrix material at a corresponding position is exposed by adopting its luminous area, self alignment is achieved, the alignment deviation problem between the black matrix and the luminous area is avoided, and accordingly the emergent light utilization rate is improved. In addition, the made black matrix can replace a circular polarizer to reduce the reflection rate of a display panel, and accordingly the flexibility of the display panel is ensured. Furthermore, the preparation method also gets rid of the limitations of an existing process evaporation mask, and the product resolution can be thus improved.

Description

technical field

[0001] The invention relates to the field of photoelectric display technology, in particular to a method for preparing an array substrate, an array substrate and a display device. Background technique

[0002] At present, the share of OLED display products in small-size products is getting higher and higher, and there are also products emerging in the medium-size class. It is foreseeable that the development will continue to accelerate in the future. The main development direction of OLED display products in the future is flexibility and ultra-high resolution. The flexible direction needs to continuously reduce the thickness of the OLED display panel. At present, the OLED substrate can achieve a thickness of about 100um, but in order to reduce the reflectivity, it is necessary to paste a circular polarizer, which leads to an increase in the overall thickness and cannot support random bending. Therefore, in order to reduce the reflection To ensure product fle...

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