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Anti-interference processing method for double-sided coated conductive glass

A technology of conductive glass and double-sided coating, applied in the direction of coating, etc., can solve the problems of complex process, low efficiency, low yield rate, etc., and achieve the effect of improving product performance, increasing resistance precision, improving technical level and competitive advantage

Active Publication Date: 2018-03-09
河源力友通讯科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Due to SiO 2 Thin film patterning requires separate equipment, the process is relatively complex, the yield rate is low, and the coating needs to be done twice, the efficiency is low, and it is rarely used in the general industry

Method used

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  • Anti-interference processing method for double-sided coated conductive glass

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Embodiment Construction

[0028] The specific embodiment of the present invention will be further described below in conjunction with accompanying drawing:

[0029] Such as figure 1 Shown, a kind of anti-interference processing method of double-sided coated conductive glass is characterized in that, comprises the steps:

[0030] 1) Transfer the substrate frame carrying the glass substrate into the vacuum chamber of the coating machine (step S100);

[0031] 2) Using plasma cations generated by a plasma gun to collide with a surface of the glass substrate, and depositing niobium pentoxide by sputtering to form a high-refractive oxide layer A (step S200 );

[0032] 3) Deposit SiO on the surface of the high refractive oxide layer A by sputtering deposition 2 And forming a low-refractive oxide layer A (step S300);

[0033] 4) Using plasma cations generated by a plasma gun to collide with the other surface of the glass substrate, and depositing niobium pentoxide by sputtering to form a high-refractive oxi...

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Abstract

The invention discloses an anti-interference processing method for double-sided coated conductive glass. The anti-interference processing method is characterized by comprising the following steps: 1)transferring a substrate support loaded with a glass substrate into a coating machine; 2) depositing a high-refraction oxide layer A on one surface of the glass substrate; 3) depositing a low-refraction oxide layer A on the surface of the high-refraction oxide layer A; 4) depositing a high-refraction oxide layer B on the other surface of the glass substrate; 5) depositing a low-refraction oxide layer B on the surface of the high-refraction oxide layer B; 6) depositing a conductive oxide layer B on the surface of the low-refraction oxide layer B; and 7) depositing a conductive oxide layer A onthe surface of the low-refraction oxide layer A. According to the processing method disclosed by the invention, the technical process is innovated, and the double-sided ITO (Indium Tin Oxide) resistance offset degree can be controlled in the production process to be within the needed + / -5%, so that the resistance accuracy is increased, the product performance is effectively improved, and the technological level and competitive advantages of coating enterprises are improved.

Description

technical field [0001] The invention relates to the technical field of conductive glass, in particular to an anti-interference processing method of double-sided coated conductive glass. Background technique [0002] With the rapid growth of the electronics industry, the use of capacitive screens has become more widespread. The double-sided coated conductive glass is the main component of the capacitive screen, and the performance of the conductive film plays a key role in the performance of the double-sided conductive glass. Therefore, in the production process, it is very important to strictly control the uniformity, heat resistance, acid and alkali resistance, high temperature resistance and high humidity resistance of the conductive film. The conductive film needs to be patterned. The difficulty of this process lies in the fact that the accuracy of etching is related to the pattern itself, electromagnetic shielding, electrostatic protection and other properties. ITO con...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C17/34
CPCC03C17/3417C03C17/3452C03C2217/734C03C2218/154C03C2218/365
Inventor 赵永刚刘敬超卫金照
Owner 河源力友通讯科技有限公司
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