Imaging optical path device and detection control method for imaging optical path device
A technology for imaging optical paths and detection objects, which is applied in the field of lithography and can solve problems such as the deterioration of pupil balance, affecting the intensity of diffracted light, and affecting imaging contrast.
Active Publication Date: 2020-06-16
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
View PDF6 Cites 0 Cited by
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
[0004] The apodization of different field points is different, which will lead to deterioration of indicators such as telecentricity and pupil balance, and its most important impact is that it will directly affect the light intensity of diffracted light relative to 0th order light, and then affect the imaging contrast
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreImage
Smart Image Click on the blue labels to locate them in the text.
Smart ImageViewing Examples
Examples
Experimental program
Comparison scheme
Effect test
Embodiment Construction
[0032] The following will combine Figure 1 to Figure 7 The imaging optical path device and the detection and control method of the imaging optical path device provided by the present invention are described in detail, which are optional embodiments of the present invention. It can be considered that those skilled in the art can, without changing the spirit and content of the present invention, Revise and polish it.
[0033] First, clarify the following basic concepts:
[0034] The equivalent 6f schematic diagram of the lithography system is shown in figure 2 shown. It can be seen from the equivalent schematic diagram that the illuminating part 1 shown in the figure can be understood as a light source surface, and the light source surface and the pupil surface are mutually conjugate surfaces. For each field point, it will correspond to a pupil surface distribution, and each grid point of the pupil surface distribution represents a beam of light with a certain spatial angle...
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More PUM
Login to View More Abstract
The invention provides an imaging light path device and a detection control method of the imaging light path device. The imaging light path device is used in a photoetching system and comprises a lighting part, a mask table and an objective assembly, wherein a light source generated by the lighting part sequentially passes through a mask on the mask table and the objective assembly and irradiatesa surface of a silicon wafer, the imaging light path device is characterized by also comprising an object surface measurement unit and an image surface measurement unit, the object surface measurementunit is arranged on an object surface of the objective assembly and is used for measuring object surface pupil information of different field points on the mask table, the image surface measurement unit is arranged on an image surface of the objective assembly and is used for measuring image surface pupil information of different field points on the surface of the silicon wafer, the transmittancedistribution condition of the objective assembly at different field points is obtained according to the object surface pupil information and the image surface pupil information, and ovality distribution of a lighting pupil in the lighting part is adjusted according to the transmittance distribution condition.
Description
technical field [0001] The invention relates to the field of photolithography, in particular to an imaging optical path device and a detection control method for the imaging optical path device. Background technique [0002] In a lithography system, the entire imaging optical path can generally be summarized as a 6f system, that is, the entire optical path is composed of 6 focal lengths. The whole 6f system can be divided into two parts: the illumination part and the objective lens imaging part. The illumination part includes 2f, while the objective imaging part includes 4f. The 4f of the imaging part of the objective lens are: 1f from the object plane to the entrance pupil plane, 2f from the entrance pupil plane to the exit pupil plane, and 1f from the exit pupil plane to the image plane. The surface separated by two fs between the entrance pupil surface and the exit pupil surface is the pupil surface, and the size of the pupil surface is the numerical aperture. The pupi...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More Application Information
Patent Timeline
Login to View More Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
CPCG03F7/20G03F7/70133G03F7/70591
Inventor 王健
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD