A kind of manufacturing method of cwdm optical filter

Abstract

The invention discloses a method for making a CWDM (Coarse Wavelength Division Multiplexing) light filter. The method comprises the following steps: placing a substrate with the thickness of 1mm to plate a main film on an umbrella working tray; directly performing ultrasonic cleaning after the main film is plated; plating an antireflection film on the back of the substrate after cleaning; and finally, cutting the substrate to obtain the finished product. According to the method for making the CWDM light filter provided by the invention, the process flow is simple, defects brought by processingin the process are reduced, and the unit output is high.

Description

technical field [0001] The invention relates to the field of optical filters, in particular to a method for manufacturing a CWDM optical filter. Background technique [0002] Traditional preparation of sparse wavelength division multiplexer (Coarse Wavelength Division Multiplexer, CWDM) filter, the process includes: first use ultrasonic wave to clean the substrate, and then coat the main film on the surface of the substrate. At this time, the substrate thickness is 10mm, and then the substrate is averaged Divide into four parts, and thin the substrate, reduce the thickness to 1mm, then clean the substrate again with ultrasonic waves, and finally coat the back of the substrate with an anti-reflective coating, and cut the substrate into 1.4mm*1.4mm*1.0 mm finished product. [0003] Among them, there are two methods of coating the main film, one is electron beam evaporation coating, such as figure 1 As shown, 01 is the monitoring point, 02 is the effective coating area, 03 is...

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Problems solved by technology

[0003] Among them, there are two methods of coating the main film, one is electron beam evaporation coating, such as figure 1 As shown, 01 is the monitoring point, 02 is the effective coating area, 03 is the ineffective coating area, the glass substrate area is 150mm in diameter, the effective coating area 02 is 120mm in diameter, 10mm in thickness, the finished product is about 3000 pieces, and the coating time is 36 Hours, less time-consuming, lower yield; another method is ion beam sputtering, such as figure 2 As shown, 04 is the monitoring point, 05 is the effective coating area, 06 is the ineffective coating area, the substrate is a ring substrate with a diameter of 300mm*40mm, and the effective coating area 05 is a ring with a diameter of 280mm and a thickness of 10mm, and the output of finished products is about 8000 pieces About 72 hours, the time is longer, the output is higher, but the output per unit time is less

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