Homogenizing element for dmd digital lithography system and its design method
A lithography system and design method technology, applied in the field of digital lithography, can solve the problems of backward development of lithography data processing software for high-speed drive boards, lack of efficient light uniform components, and influence on light uniformity effects, etc., to achieve light energy reflection and Less refraction loss, improved uniform light effect, improved uniformity of light intensity
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[0029] According to the non-imaging optical design theory, the free-form surface of the rear surface of the sub-lens is designed. Using the principle of energy mapping, calculate the relative position of each sub-lens and the shape of the free-form surface on the rear surface, process on a whole piece of lens material, and only process the rear surface of the material to form "sub-lenses" one by one, and complete the "sub-lens" of the sub-lens Stitching" to design a complete free-form surface microlens array.
[0030] Such as figure 1 As shown in Fig. 1, the free-form surface and the target surface are first divided into equal-energy grids, and then the one-to-one correspondence between the free-form surface and the target surface is established according to the method of energy mapping. The present invention is mainly applied to DMDs with an aspect ratio of 1:2, so the aspect ratio of each sub-lens is also designed to be 1:2. Taking the front surface of the sub-lens as the ...
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