LED chip cutting channel mark and manufacturing method thereof
A technology of LED chips and manufacturing methods, which is applied to electrical components, electrical solid devices, circuits, etc., can solve the problems of difficult control of the cutting line, and achieve the effects of low cost, strong practicability, and simple operation
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Embodiment 1
[0035] like figure 1 , figure 2 and image 3 As shown, the crystal grains on the LED chip are generally arranged neatly to form a longitudinal cutting line 101 and a transverse cutting line 102. The traditional cutting method is to alternately perform several horizontal cuttings and several longitudinal cuttings along the cutting line. The method is improved, and a cutting road mark 3 is made on the cutting road. The cutting road mark 3 is located on the lateral and longitudinal cutting roads of the LED chip, and is formed by wet etching, and the depth is about. In this embodiment, the dicing lane markings are preferably square, with a side length of 28 μm, and are arranged equidistantly on the LED chip dicing lanes, and the markings on the same dicing lane are located on a straight line. identification, can be used as a reference mark during the cutting process.
[0036] The manufacturing method of the above-mentioned LED chip dicing road marking includes the following ...
Embodiment 2
[0045] like figure 1 , figure 2 and image 3 As shown in the figure, an LED chip cutting road mark is located on the LED chip cutting road, formed by wet etching, and the depth is about. In this embodiment, the dicing lane marks are preferably circular, with a diameter of 25 μm, and are arranged equidistantly on the LED chip dicing lanes, and the markings on the same dicing lane are located on a straight line.
[0046] The manufacturing method of the above-mentioned LED chip dicing road marking includes the following steps:
[0047] a. Vacuum coating: Evaporate a silicon dioxide layer on the P side of the LED chip, and the thickness of the silicon dioxide layer is
[0048] b. Photolithography: photolithography is performed on the silicon dioxide layer coated in step a, and photoresist is used to protect the marking of the cutting track and the electrode area;
[0049] c. Wet etching of silicon dioxide layer: wet etching is performed on the silicon dioxide layer on the...
Embodiment 3
[0055] like figure 1 , figure 2 and image 3 As shown in the figure, an LED chip cutting road mark is located on the LED chip cutting road, formed by wet etching, and the depth is about. In this embodiment, the dicing lane marks can be rhombus or polygonal. On the premise that the manufacturing method is simple, you can choose which shape to make according to your needs, preferably a square, with a side length of 30 μm, which are arranged equidistantly on the LED chip dicing lane, and the same cut Road markings are in a straight line.
[0056] The manufacturing method of the above-mentioned LED chip dicing road marking includes the following steps:
[0057] a. Vacuum coating: Evaporate a silicon dioxide layer on the P side of the LED chip, and the thickness of the silicon dioxide layer is
[0058] b, photolithography: carry out photoetching treatment on the silicon dioxide layer after the coating in step a, and cut the track mark and the electrode area ( figure 1 2 i...
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