Color film forming method based on continuous magnetron sputtering

Abstract

The invention relates to the magnetron sputtering film forming technique and particularly relates to a color film forming method based on continuous magnetron sputtering. The method comprises the steps of carrying out sputtering coating on the surface of a to-be-coated base material so as to form one or more metal film layers, and coating the surface of the outermost metal film layer with one or more reaction film layers, or firstly carrying out sputtering coating on the surface of the to-be-coated base material so as to form one or more reaction film layers, and coating the surface of the outermost reaction film layer with one or more metal film layers, wherein the reaction film layers are prepared by reaction of metal target materials sputtered in vacuum cavities with reactant gas and depositing, the thickness of the metal film layers is 5nm-35nm, the average visible light reflectivity is 20%-75%, and the introduction amount of reactant gas is 30ml/min-80ml/min. By virtue of mutual cooperation between the metal film layers and the reaction film layers, the preparation of multiple color films is realized, the film coating process is stable and simple, and the coating film with relatively high brightness can be prepared without excessively increasing the thickness of the reaction film layers.

Description

technical field [0001] The invention relates to a magnetron sputtering film forming technology, in particular to a color film forming method based on continuous magnetron sputtering. Background technique [0002] Sputtering deposition is the use of energetic ions in the plasma to bombard the surface of the target in a vacuum environment, so that the atoms or ions on the target are bombarded, and the bombarded particles are deposited on the surface of the substrate to grow into a thin film. Magnetron sputtering has achieved rapid development and wide application since its inception because of its fast deposition rate, high purity, good compactness and good film uniformity of the film obtained by sputtering, which has strongly impacted other industries. the status of the coating method; [0003] Generally speaking, what color the metal target is, it will be the color after the film is formed. Common such as sputtering aluminum to get aluminum bright white, sputtering brass t...

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Problems solved by technology

It is also possible to directly sputter oxide targets (such as silicon dioxide targets, titanium dioxide targets) to generate color films of different colors. However, for reactive films, only when the film layer reaches a certain thickness can sufficient color be obtained. Depth and brightness, while magnetron sputtering multi-layer reaction film requires relatively high vacuum degree of equipment and sputtering deposition film rate, it is difficult for low-configuration coating equipment to coat oxide targets or relatively thick gases Reactive film layer, therefore, the cost of sputtering multi-layer gas reactive film is relatively high, and it is difficult for small-scale companies to put it into mass production

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