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Substrate Processing System

A substrate processing system and substrate processing technology, applied in conveyors, electrical components, conveyor objects, etc., can solve the problems of decreased production capacity and overall productivity of substrate processing devices, and achieve the effect of improving productivity

Active Publication Date: 2021-11-26
WONIK IPS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0010] In such a situation, even if a maximum of three substrate processing modules 100 are combined with the transport module 200 whose planar shape is a quadrangular shape, only two substrate processing modules 200 can be combined, so the production capacity is reduced. In the case where 200 is shipped out of the tray 20, the mass production of the substrate processing module 100 should be terminated, so there is a problem that downtime occurs and the overall productivity of the substrate processing apparatus decreases.

Method used

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Embodiment Construction

[0034] The substrate processing system of the present invention will be described below with reference to the drawings.

[0035] The substrate processing system of the present invention, such as Figure 2 to Figure 4 As shown, it includes: a plurality of substrate processing modules 100, forming a closed processing space (S), and performing substrate processing in a state where a plurality of substrates are loaded on a tray 20; a transport module 200, provided with a transport robot 210, and the described A plurality of substrate processing modules 100 are combined to transport the tray 20 to or from the substrate processing module 100 respectively; the substrate exchange module 300 is combined with the transport module 200 to complete the substrate processing in the substrate processing module 100 The substrate 10 is unloaded from the tray 20 , and the substrate to be processed is loaded on the tray 20 .

[0036] The substrate processing module 100, as a structure for formin...

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Abstract

The present invention relates to a substrate processing system, and more specifically, relates to a substrate processing system using plasma to process a substrate. The invention discloses a substrate processing method, which is characterized in that it comprises: a plurality of substrate processing modules (100) forming an airtight processing space (S), and performing substrate processing in a state where a plurality of substrates are loaded on a tray (20) The transport module (200) is provided with a transport robot (210), combined with the plurality of substrate processing modules (100), respectively transporting or importing the tray (20) into the substrate processing module (100); the substrate The exchange module (300), combined with the transport module (200), unloads the substrates (10) that have been processed in the substrate processing module (100) from the tray (20), and loads the substrates to be processed on the Trays (20). The substrate exchange module (300) includes: a tray carrying out unit (310), which is delivered by a delivery robot (210) in order to carry out the tray (20) to the outside.

Description

technical field [0001] The present invention relates to a substrate processing system, and more specifically, to a substrate processing system for performing deposition, etching, and other substrate processing. Background technique [0002] The structure of the so-called substrate processing module includes a vacuum chamber forming a closed processing space, and a substrate supporting part, which is provided with a substrate disposed in the vacuum chamber, and is a device for etching or depositing the surface of the substrate. [0003] The substrates processed by the substrate processing module include: wafers for semiconductors, glass substrates for LCD panels, substrates for OLEDs, substrates for solar cells, etc. [0004] As an example of the above-mentioned substrate processing module, there is a substrate processing module in which a solar cell is placed on a substrate supporting part, and a cover member formed of a plurality of openings is covered on the upper side of ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/67
CPCH01L21/67167H01L21/67196B65G47/90B65G49/061B65G2201/022H01L21/0226H01L21/306H01L21/6773H01L21/67739H01L21/67766H01L21/67778
Inventor 严用铎张锡弼许贤康
Owner WONIK IPS CO LTD