Novel graphite boat

Abstract

The invention discloses a novel graphite boat which comprises at least eight graphite boat blades, namely a first graphite boat blade, a second graphite boat blade, a third graphite boat blade, a fourth graphite boat blade, a fifth graphite boat blade, a sixth graphite boat blade, a seventh graphite boat blade and an eighth graphite boat blade, wherein the first graphite boat blade and the eighthgraphite boat blade are designed to be outermost; all the graphite boat blades are parallel to one another; first clamping points, second clamping points and third clamping points which are used for fixing silicon wafers are arranged on all the graphite boat blades; and through the first clamping points, the second clamping points and the third clamping points, the silicon wafers can be fixed on all the graphite boat blades. According to the technical scheme, the warping of the silicon wafers during a film coating process can be effectively reduced, thereby reducing the color difference, the rework and the alarm as well as improving the qualification rate and the yield; the positions of the clamping points are redesigned, so that the silicon wafers can be better clamped by the clamping points and the stress on the silicon wafers in the novel graphite boat can be more uniform; and at the positions of the clamping points, the silicon wafer inserting feasibility can further be considered.

Description

technical field [0001] The invention relates to the technical field of solar cell panel manufacturing, and more specifically, relates to a novel graphite boat. Background technique [0002] PECVD: Plasma Enhanced Chemical Vapor Deposition, which uses SIH4 and NH3 to form a layer of light blue silicon nitride anti-reflection film on the suede surface of the silicon wafer under the state of plasma glow discharge. Because graphite has good conductivity and stability, the carrier for silicon wafers in PECVD is a graphite boat. In the process of solar energy and semiconductor production, when coating, the uncoated silicon wafer is inserted into the carrier of the PECVD coating equipment, usually the carrier is realized by a graphite boat, that is, the uncoated silicon wafer is inserted into the graphite boat, and then , place the graphite boat in the cavity of the PECVD vacuum coating equipment, and use the PECVD process for discharge coating. After the coating is completed, tak...

AI Technical Summary

Problems solved by technology

[0003] The stuck point design of the current graphite boat blade is as follows: figure 1 As shown, the position of the No. 2 stuck point is low. When the silicon wafer is on the boat, the position of the upper right corner is not fixed. Due to factors such as high temperature and stress, it is easy to warp

The current silicon cell PECVD technology also has the situation that the small furnace tube enters the large boat, resulting in a smaller blade pitch of the graphite boat.

Combining the above factors, the warping of silicon wafers in the furnace can easily cause color difference, and in severe cases, it will cause radio frequency alarms to be released, affecting the pass rate and output

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