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Parallel circumferential continuous plasma coating device

A technology of plasma and coating device, applied in the field of plasma coating device, can solve the problems of increasing production cost, production time and production space, complex structure of continuous vacuum coating equipment, increasing difficulty and cost of fault maintenance, and achieving vacuum maintenance. The method is simple, the equipment cost and maintenance cost are reduced, and the exchangeability is strong.

Active Publication Date: 2020-02-14
WENZHOU POLYTECHNIC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The structure of the continuous vacuum coating equipment is complicated, and multiple independent coating chambers need to be equipped with multiple high vacuum pump groups. The use of a large number of gates increases the production cost, production time, and production space. The complex equipment increases the difficulty of driving the workpiece to be coated. The existence of multiple cavities also increases the difficulty and cost of fault maintenance in the production process. The high threshold of continuous coating equipment greatly increases the cost of use of the enterprise; The size limits the processing size of special-shaped parts. On the other hand, the processing process requires a lot of manpower for loading and unloading, which is costly and is not conducive to continuous production

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Embodiment Construction

[0034] In order to make the purpose, technical solutions and advantages of the present invention clearer, below in conjunction with embodiment and accompanying drawing, the present invention is described in further detail:

[0035] For the convenience of description, in the present invention, the vacuum acquisition and atmospheric recovery of the vacuum system of the vacuum device are briefly described.

[0036] The vacuum device is welded and assembled with structural metal carbon steel, stainless steel, etc. In order to obtain the required vacuum degree, it is necessary to install an exhaust system on the vacuum device. Generally, the exhaust system is divided into two parts: a rough pumping system and a fine pumping system. The rough pumping system generally consists of a mechanical pump with a high pumping speed, a Roots pump, and a backing valve controlled by a cylinder and a solenoid valve. The fine pumping system includes one or more sets of high vacuum pumps and the bac...

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Abstract

The invention relates to a parallel circumferential direction continuous type plasma coating device which comprises a technological cavity, a rotary cavity, a feeding system, a vacuum system and a material trolley, wherein a plurality of groups of technological assembly sealing plates, a plurality of groups of storage cavities distributed in the circumferential direction, a rotary device, and a material guiding device are arranged in the technological cavity; the rotary cavity is provided with a rotary telescopic device, a material transmission device and a material cavity; a feeding hole is provided with a sealing door sheet capable of being opened and closed; the vacuum system carries out vacuum treatment on the combined body of the technological cavity and the rotary cavity and on the feeding hole; tree form single hanging material is loaded on the material trolley; an independent vacuum chamber is formed in the technological cavity and independently carries out technological process; the rotary device can realize transmission and autoroatation of the material trolley; the material cavity in the rotary cavity, the storage cavity and the feeding hole form a sealed independent vacuum chamber and realize transmission of the material trolley; and a feeding system can take out and put into material. With adoption of the scheme, the parallel circumferential direction continuous type plasma coating device can realize batch parallel continuous coating production of the single hanging material.

Description

technical field [0001] The invention belongs to the technical field of vacuum coating equipment, and in particular relates to a parallel circumferential continuous plasma coating device. Background technique [0002] Existing vacuum coating equipment can be divided into single-type coating machines and continuous coating equipment according to the number of vacuum chambers in the vacuum equipment. [0003] The single-body coating machine usually consists of a vacuum chamber and an air extraction system. The vacuum coating process modules are loaded in different positions of the chamber. When the required vacuum degree is reached, the required vacuum coating process modules are activated in order to achieve The processing of the surface of the material, the single cavity leads to the need to open and close the door when the product is in and out, and the continuous production of the product cannot be carried out, which will greatly reduce the production efficiency and increas...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/56
CPCC23C14/568
Inventor 郎文昌高斌刘伟
Owner WENZHOU POLYTECHNIC
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