Parallel circumferential continuous plasma coating device
A technology of plasma and coating device, applied in the field of plasma coating device, can solve the problems of increasing production cost, production time and production space, complex structure of continuous vacuum coating equipment, increasing difficulty and cost of fault maintenance, and achieving vacuum maintenance. The method is simple, the equipment cost and maintenance cost are reduced, and the exchangeability is strong.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0034] In order to make the purpose, technical solutions and advantages of the present invention clearer, below in conjunction with embodiment and accompanying drawing, the present invention is described in further detail:
[0035] For the convenience of description, in the present invention, the vacuum acquisition and atmospheric recovery of the vacuum system of the vacuum device are briefly described.
[0036] The vacuum device is welded and assembled with structural metal carbon steel, stainless steel, etc. In order to obtain the required vacuum degree, it is necessary to install an exhaust system on the vacuum device. Generally, the exhaust system is divided into two parts: a rough pumping system and a fine pumping system. The rough pumping system generally consists of a mechanical pump with a high pumping speed, a Roots pump, and a backing valve controlled by a cylinder and a solenoid valve. The fine pumping system includes one or more sets of high vacuum pumps and the bac...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com