Vertical circumferential circulation continuous type vapor deposition equipment
A vapor deposition and vertical technology, which is applied in the field of vertical circumferential circulation continuous vapor deposition equipment, can solve the problem of increasing production cost, production time and production space, increasing the difficulty and cost of fault maintenance, and increasing the difficulty of transmission of workpieces to be plated. and other problems, to achieve the effect of shortening production takt time, reducing equipment cost and maintenance cost, and strong interchangeability
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0034] For the convenience of description, in the present invention, the obtaining of vacuum and restoring the atmosphere of the vacuum device are briefly described.
[0035] The vacuum device is welded and assembled with structural metal carbon steel, stainless steel, etc. In order to obtain the required vacuum degree, it is necessary to install an exhaust system on the vacuum device. Generally, the exhaust system is divided into two parts: a rough pumping system and a fine pumping system. The rough pumping system generally consists of a mechanical pump with a high pumping speed, a Roots pump, and a backing valve controlled by a cylinder and a solenoid valve. The fine pumping system includes one or more sets of high vacuum pumps and the backing pump unit of the high vacuum pump; The process of obtaining vacuum is: start the pump group of the rough pumping system and the front valve to pump the vacuum device, and when a certain vacuum degree is reached, use the fine pumping sys...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com