Cold cathode arc plasma source and non-contact arc ignition method
A plasma source and cold cathode technology, applied in the field of ion sources, can solve the problems of interfering with the movement of the arc spot on the surface of the cathode, volatilization of ignition needle elements to pollute the plasma, and burning of the ignition needle, so as to save installation space, low production cost, and convenient installation The effect of maintenance
Active Publication Date: 2019-09-10
XINGJI ELECTRIC APPLIANCE CO LTD
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Problems solved by technology
Due to the short distance between the electrodes, the ignition needle used as the auxiliary ignition electrode will interfere with the movement of the arc spot on the cathode surface. At the same time, the ignition needle's proximity to the hot cathode arc spot will cause the elements of the ignition needle to volatilize and pollute the plasma; more seriously, it will burn the ignition. Needle
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[0027] In order to more clearly illustrate the embodiments of the present invention and / or the technical solutions in the prior art, the specific implementation manners of the present invention will be described below with reference to the accompanying drawings. Obviously, the drawings in the following description are only embodiments of the present invention, and those skilled in the art can also obtain other drawings based on these drawings and obtain other implementation.
[0028] See figure 1 , the cold cathode arc plasma source shown includes a cathode substrate 1, a water-cooled copper plate 2 with a cooling channel, a copper plate pressure ring 3, a cathode target 4, a pressure target ring 5, an arc limiting component, a coil component and an ignition component. In this embodiment, the cathode substrate 1 is made of a 304 stainless steel circular plate, on which there are sealing grooves, screw holes and other structures, and other components are directly or indirectly...
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The invention discloses a cold cathode arc plasma source and a non-contact arc striking method. The plasma source comprises a cathode substrate, a water-cooled copper plate, a copper plate pressing ring, a cathode target, a target pressing ring, an arc limiting assembly, a coil assembly and an ignition assembly; the water-cooled copper plate is arranged on the cathode substrate, the cathode targetis arranged on the water-cooled copper plate, the copper plate pressing ring is arranged on the periphery of the water-cooled copper plate, and the thickness of the copper plate pressing ring is larger than that of the water-cooled copper plate; the target pressing ring is arranged on the periphery of the cathode target, a hollow cavity is formed between the target pressing ring and the peripheryof the cathode target, and a plurality of air inlet holes communicating with the hollow cavity are uniformly distributed in the target pressing ring; the arc limiting assembly is arranged on the periphery of the cathode target, the coil assembly is arranged below the cathode substrate, a central through hole is formed in each of the center of the cathode substrate and the center of the cathode target, and the ignition assembly is arranged in the central through holes. According to the plasma source, a moving part does not exist, so that the manufacturing cost is low, the installation and maintenance are convenient, and the installation space is saved. According to the arc striking method, adverse effects caused by the fact that a cathode and an anode are too close can be avoided.
Description
technical field [0001] The invention belongs to the technical field of cold cathode arc plasma sources, and in particular relates to a cold cathode arc plasma source and a non-contact arc striking method. Background technique [0002] Cathodic arc deposition refers to the vapor emission from the evaporation source (ie, cathode) thin film material generated by arc discharge in a vacuum chamber, and deposited on the substrate under the action of negative bias to form a thin film. During the arc discharge process, one or more arc spots are formed on the surface of the cathode evaporation source, and electrons, ions, neutral atoms, and large particles of source materials are emitted due to the high temperature and high current density of the arc spots. Source species ions are the most important species in thin film deposition. One of the characteristics of cathodic arc deposition is that the energy of incident evaporated ions is high enough, so it is easy to produce high-densit...
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IPC IPC(8): C23C14/32
Inventor 王向红黄志宏吴百中陈上挺
Owner XINGJI ELECTRIC APPLIANCE CO LTD