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A surface anti-reflection film manufacturing process for a plate containing polymethyl methacrylate

A technology of polymethyl methacrylate and process technology, which is applied in the direction of metal material coating technology, instruments, optical components, etc., can solve the problems of cracking, poor adhesion, and poor surface hardness of the evaporated layer, and achieve the reduction of the vaporized layer. cracking effect

Inactive Publication Date: 2020-07-14
上海道助电子科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The present invention aims to overcome the above-mentioned defects, and proposes a new type of evaporation process, which can effectively reduce the reflectivity on the one hand, and effectively reduce and improve the cracking of the evaporation layer, poor surface hardness, easy scratching, and poor adhesion on the other hand. The problem of partial shedding

Method used

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  • A surface anti-reflection film manufacturing process for a plate containing polymethyl methacrylate
  • A surface anti-reflection film manufacturing process for a plate containing polymethyl methacrylate

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Embodiment Construction

[0029] This embodiment provides a treatment process for the surface of a plate containing polymethyl methacrylate, specifically, adding a layer of polymethyl methacrylate with a thickness of 20-30nm between the polymethyl methacrylate substrate and the evaporated anti-reflection film layer. silicon monoxide.

[0030] The design structure of this embodiment is as follows, PMMA / M / H1 / L1 / H2 / L2 / H3 / L3 / Air.

[0031] Among them, M represents silicon monoxide, and its refractive index is N=1.55

[0032] H1, H2, and H3 all represent vapor-deposited layers of ceramic materials with a high refractive index, and their refractive index is N=2.3-2.35;

[0033] L1, L2, and L3 all represent vapor-deposited layers of ceramic materials with a low refractive index, and their refractive index is N=1.45-1.46;

[0034] In the process of evaporating silicon monoxide M: no oxygen is introduced and no ion source is used to assist, and the rate of silicon monoxide deposition is set at 3-3.5A / S.

[00...

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Abstract

The invention provides a composite board surface antireflection film manufacturing process which is characterized in that silicon monoxide is evaporated on the composite board surface and then evaporation of an antireflection film layer is performed. According to the novel evaporation process, the reflectivity can be effectively reduced, and the problems of the cracks of the evaporation layer, scratching because of poor surface harness and local falling because of poor adhesion can be effectively reduced and improved.

Description

technical field [0001] The invention relates to the field of surface treatment, in particular to an anti-reflection film manufacturing process on the surface of a plate containing polymethyl methacrylate. Background technique [0002] With the rapid development of science and technology, 3C products are even more competitive among hundreds of companies. Without any innovation and optimization, it is nothing but to make consumers' daily life more convenient and digital life. Plastic cover panels have higher and higher specification requirements for diversified technological products. [0003] The main purpose of the plastic cover is to protect the internal lens or display. As the product specifications become higher and higher, the optical specification of the cover surface needs to be added with an anti-reflection film to reduce the impact of the surface reflectivity of 4%. At present, anti-reflection is carried out on the surface of the plastic cover. The film manufacturin...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B1/11G02B1/113G02B1/115C23C14/08C23C14/30C23C14/32
CPCC23C14/08C23C14/30C23C14/32G02B1/11G02B1/113G02B1/115
Inventor 唐纯瑞王彬代璐
Owner 上海道助电子科技有限公司