A planar holographic grating scanning exposure device
A planar holographic grating and scanning exposure technology, which is applied in the field of planar holographic grating scanning exposure devices, can solve problems such as high cost, high environmental control requirements, and complex system composition, and achieve low cost, low environmental requirements, and simple system composition Effect
Active Publication Date: 2019-12-17
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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Problems solved by technology
The system composition is complex, the cost is high, and the use of interferometers has high requirements for environmental control
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[0021] In order to enable those skilled in the art to better understand the solutions of the present invention, the following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only It is an embodiment of a part of the present invention, but not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts shall fall within the protection scope of the present invention.
[0022] The terms "first", "second", "third", "fourth", etc. (if any) in the description and claims of the present invention and the above drawings are used to distinguish similar objects, and not necessarily Used to describe a specific sequence or sequence. It is to be understood that the terms so used are interchangeable under app...
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The planar holographic grating scanning exposure device provided by the present invention includes a light source laser, a collimation system, an interference pattern generation unit, an X-direction motion table for carrying the interference pattern generation unit, a Y-direction motion table and a controller, and the interference pattern generation The two coherent beams generated by the unit are respectively the first coherent beam and the second coherent beam. The first coherent beam and the second coherent beam intersect on the Y-direction motion table to form an interference pattern. In the control Under the control of the device, the X-moving table performs stepping motion along the X direction, and the Y-moving table performs reciprocating motion along the Y direction. The scanning exposure of the planar holographic grating can be performed by using the millimeter-level interference pattern, avoiding the In the traditional planar holographic grating exposure device, the defects on the large-aperture optical elements have an impact on the grating production, and the disturbance in the exposure process can be scanned and averaged. The system composition is relatively simple, the cost is low, and the environmental requirements are low.
Description
technical field [0001] The invention relates to the field of holographic grating production, in particular to a planar holographic grating scanning exposure device. Background technique [0002] The specific process of making a planar holographic grating is to coat a layer of photoresist or other photosensitive material with a given thickness on an optically stable flat glass substrate. Two coherent beams are formed by the laser to produce a series of uniform interference fringes on the coating, and the photosensitive material is photosensitive. Then use a special solvent to dissolve away the photosensitive part, that is, obtain a holographic image of interference fringes on the etched layer. The prepared diffraction grating is a transmission type; if a layer of aluminum reflective film is coated on the surface of the glass blank, it can be made into a reflection type diffraction grating. The grating groove density produced by this method is high, and the width of the cutt...
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IPC IPC(8): G02B5/18G03F7/20
CPCG02B5/1857G03F7/704G03F7/70725
Inventor 巴音贺希格宋莹唐玉国王玮齐向东李文昊
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI