A debugging method for planar holographic grating scanning exposure device
A flat holographic grating and scanning exposure technology is applied in the debugging field of flat holographic grating scanning exposure devices, which can solve the problems of complex system composition, high environmental control requirements of interferometers, high cost, etc., and achieves low environmental requirements and shortens test time. , the effect of low cost
Active Publication Date: 2019-12-27
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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This method adopts heterodyne phase measurement, the grating substrate is carried by the two-dimensional motion workbench for two-dimensional movement, and the laser interferometer is used to precisely measure the displacement of the workbench to realize feedback control, but the system composition is complex, the cost is high, and the interferometer The use requires high environmental control
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[0022] In order to enable those skilled in the art to better understand the solutions of the present invention, the following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only It is an embodiment of a part of the present invention, but not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts shall fall within the protection scope of the present invention.
[0023] The terms "first", "second", "third", "fourth", etc. (if any) in the description and claims of the present invention and the above drawings are used to distinguish similar objects, and not necessarily Used to describe a specific sequence or sequence. It is to be understood that the terms so used are interchangeable under app...
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The invention discloses a method for debugging a planar holographic grating scanning exposure device, which facilitates the rapid completion of device debugging, shortens the test time, and can use millimeter-level interference patterns to perform scanning exposure of a planar holographic grating, avoiding the traditional planar holographic grating exposure device. , the impact of defects on large-aperture optical components on the production of gratings, and the disturbance in the exposure process can be scanned and averaged, the system composition is relatively simple, the cost is low, and the environmental requirements are low.
Description
technical field [0001] The invention relates to the field of holographic grating production, in particular to a debugging method for a planar holographic grating scanning exposure device. Background technique [0002] The exposure process is one of the most important process links in the production process of holographic grating. In the traditional static planar holographic grating exposure method, the optical elements of the exposure device are fixed on a stationary optical platform. In order to ensure the exposure of the effective area of the grating substrate, the size of the interference field needs to be larger than the size of the grating substrate. Therefore, the static planar holographic grating exposure system will include a large-diameter collimator lens or Loe mirror, and the defects on the large-diameter optical element will be directly recorded on the grating substrate. In addition, changes in the external environment will affect the exposure contrast of the ...
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IPC IPC(8): G02B5/18G03F7/20
CPCG02B5/1857G03F7/704G03F7/70725
Inventor 巴音贺希格宋莹唐玉国姜珊李文昊齐向东
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI