Space catalysis type chemical gas phase deposition equipment

Abstract

The invention provides space catalysis type chemical gas phase deposition equipment. The space catalysis type chemical gas phase deposition equipment comprises a gas feeding device and isolation devices. The gas feeding device comprises reaction gas outlets and catalyst outlets for conveying gases to a base material. The isolation devices are distributed around the catalyst gas, by means of the isolation devices, distribution of the catalyst gas in the space enclosed by the isolation devices can be controlled precisely, and a mixed reaction of two reaction gases in the space where the catalystis concentrated realizes localization in space. Based on the space catalysis type chemical gas phase deposition equipment, the concentration distribution of the catalyst in the localized space is controlled through hardware design; and meanwhile, the feeding amount of the reaction gases on the two sides dispersed into the space is controlled, then the reaction rate of a catalysis reaction in thelocalized space can be controlled precisely, and through relative movement of the gas feeding device and the base material, uniform deposition and film forming are performed on the base material.

Description

technical field [0001] The invention relates to a space catalytic chemical vapor deposition equipment, in particular to a space catalytic chemical vapor deposition equipment in which reaction gas reacts and deposits in the local space where the catalyst is located, and the reaction deposition rate is precisely adjustable. Background technique [0002] The catalytic reaction in the chemical reaction is the cornerstone of the modern chemical energy industry, such as the catalytic refining of petroleum and coal, and the downstream such as the organic plastics industry. Most organic polymer monomers are polymerized using catalytic reactions. [0003] Applying catalytic reaction to chemical vapor deposition equipment to prepare various functional thin films has always been a research hotspot. In a broad sense, a catalytic reaction is to reduce the activation energy of a chemical reaction, typically such as reducing the required extreme conditions such as high temperature and high...

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Problems solved by technology

This is because if there is no special design, directly passing the gaseous catalyst into the chemical vapor deposition equipment often leads to uneven film formation of the reaction deposition, because the catalyst can reduce the reaction activation energy and speed up the reaction speed, and its concentration greatly affects the reaction deposition rate , the distribution of the gas flow field needs special treatment in order to effectively and uniformly deposit and form a film

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