Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Stripping liquid regeneration device and process

A regeneration device and stripping liquid technology, which is applied to the photoplate making process, distillation separation, and separation methods of the patterned surface, can solve the problems of low regeneration efficiency, affecting the recycling effect of photoresist stripping liquid waste liquid, and low yield, etc. problem, to achieve high efficiency and uniform preheating process, and improve the effect of primary separation efficiency

Pending Publication Date: 2018-09-25
四川久远化工技术有限公司
View PDF0 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] When the existing technology is used to regenerate the waste liquid of the stripping liquid, the overall regeneration efficiency is low and the yield is not high, which affects the recycling effect of the waste liquid of the photoresist stripping liquid

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Stripping liquid regeneration device and process
  • Stripping liquid regeneration device and process
  • Stripping liquid regeneration device and process

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0057] See attached figure 1 , figure 2 and image 3 The present invention is further described.

[0058] The present invention is realized through the following technical solutions:

[0059] A stripping liquid regeneration process, is characterized in that, comprises the following steps:

[0060] Step 1) Use the raw material feed pump (11) to pump the stripping liquid waste liquid to the stripping liquid waste liquid smelting pool (12), and the stripping liquid waste liquid is melted and liquefied in the stripping liquid waste liquid melting pool (12) to obtain complete Liquefied primary stripper waste liquid;

[0061] Step 2) Use the waste liquid delivery pump (13) to pump the completely liquefied first-level stripping liquid waste liquid in step 1) to the inside of the first-level membrane filter tank (14), and use the first-level membrane filter tank (14) to The metal ions are separated by membrane filtration to obtain the waste liquid of the secondary stripping liqu...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Inner diameteraaaaaaaaaa
Lengthaaaaaaaaaa
Login to View More

Abstract

The invention relates to a stripping liquid regeneration device and process. The device structurally comprises a dewatering rectification tower, a film evaporator and a decolorizing rectification tower arranged sequentially along the flow direction of stripping liquid in a waste stripping liquid purification process, wherein the feeding hole end of the dewatering rectification tower is provided with a waste stripping liquid smelting pool and a primary film filtration pool which are connected in sequence. By adopting the stripping liquid regeneration device and process, the overall regenerationefficiency of the stripping liquid and the final yield of the stripping liquid are increased, and the demand of recycling of the waste stripping liquid of photoresist is met.

Description

technical field [0001] The invention relates to the technical field of stripping liquid regeneration, in particular to a stripping liquid regeneration device and a regeneration process. Background technique [0002] The rapid development of the domestic electronics manufacturing industry has greatly increased the use of electronic chemicals such as strippers. In the production process of electronic components such as liquid crystal display panels and semiconductor integrated circuits, it is necessary to use a stripper to remove the photoresist coated on the microcircuit protection area as a mask. The commonly used stripper is composed of organic amine and polar organic A mixture of solvents with a small amount of light components represented by water. The above-mentioned organic amines include monoethanolamine (MEA), dimethylacetamide (DMAC), N-methylformamide (NMF) or N-methyldiethanolamine (MDEA); polar organic solvents include diethylene glycol ether (DGME), diethylene ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): B01D3/14G03F7/42
CPCB01D3/145B01D3/148G03F7/425
Inventor 周建蔡雅棠马晓明申丹丹王超
Owner 四川久远化工技术有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products