Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for building PPy (polypyrrole) thin film with multiple forms based on silicon template

A technology of polypyrrole and template, applied in the direction of coating, etc., can solve the problems of limiting the application range and increasing the specific surface area of ​​PPy film, and achieve the effect of good repeatability, avoiding complicated preparation process and avoiding operation steps

Inactive Publication Date: 2018-10-16
TIANJIN UNIV
View PDF5 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

PPy films prepared by traditional methods generally only have a secondary structure, which limits its application range. If a surface-patterned PPy film with a multi-level structure can be obtained, the specific surface area of ​​the PPy film can be effectively increased, which in turn can Expand its field of application

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for building PPy (polypyrrole) thin film with multiple forms based on silicon template
  • Method for building PPy (polypyrrole) thin film with multiple forms based on silicon template
  • Method for building PPy (polypyrrole) thin film with multiple forms based on silicon template

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0019] Embodiment 1: a kind of method for building polypyrrole film with multi-level morphology based on silicon template, comprises the following steps:

[0020] Step 1: Mix the PDMS prepolymer and crosslinking agent according to the mass ratio of 10:1, pour it into a centrifuge tube, and stir with a glass rod to form a uniform mixture;

[0021] Step 2: vacuum degas the mixture of PDMS prepolymer and cross-linking agent for 1 hour, pour it into a square container with a silicon template, and distribute it evenly in the petri dish;

[0022] Step 3: Vacuum degas the mixture of prepolymer and crosslinking agent poured into the petri dish for 30 minutes, then put it in an oven, heat and cure at 70°C for 4 hours, and obtain a PDMS stamp with a silicon template pattern;

[0023] Step 4: Dissolving 0.2013g of pyrrole monomer in 30ml of hydrochloric acid, then dissolving 0.9732g of ferric chloride in 30ml of hydrochloric acid, and ultrasonically mixing;

[0024] Step 5: First transf...

Embodiment 2

[0026] Embodiment 2: a kind of method that builds the polypyrrole thin film with multilevel morphology based on silicon template, in embodiment 2, except that step five is different from the step in embodiment 1, other steps are all the same. In step five, the reaction time is adjusted from 3h to 7h, and the obtained polypyrrole film material is as follows image 3 and Figure 4 shown.

[0027] The invention deposits a PPy film on a PDMS stamp by using a template replication method to obtain a PPy film with a multi-level wrinkle structure. PPy films with different surface morphologies can be obtained by adjusting different reaction times. The longer the reaction time, the larger the wrinkle period obtained. The method of the invention overcomes the previous shortcomings of complicated preparation process and poor process controllability.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a method for building a PPy (polypyrrole) thin film with multiple forms based on a silicon template. The method adopts a preparation process with the following steps of firstly, casting a mixture of a PDMS (polydimethylsiloxane) prepolymer and a crosslinking agent onto the silicon template, heating and curing, so as to obtain a PDMS stamp with the silicon template patterns;then, depositing the PPy thin film with certain thickness at the surface, so as to obtain the PPy thin film which is of a multiple-wrinkle structure. The PPy thin film with different surface forms can be obtained by adjusting the different reaction time; the longer the reaction time is, and the longer the obtained wrinkle cycle is. The method overcomes the defects of complicated preparation process and poor controllability in process, and has the advantages that the operation mode is simple, the conductive polymer has multiple forms, and the defects of complicated operation, high cost, nonuniform patterns, small area and the like in the existing photoetching methods and other patterning methods are overcome.

Description

technical field [0001] The present invention relates to the preparation of polymer film with multi-level wrinkle structure. Background technique [0002] Surface-patterned polypyrrole thin film materials have attracted widespread attention and are widely used in people's lives, such as superhydrophobic materials and flexible electronic devices. PPy films prepared by traditional methods generally only have a secondary structure, which limits its application range. If a surface-patterned PPy film with a multi-level structure can be obtained, the specific surface area of ​​the PPy film can be effectively increased, which in turn can Expand its field of application. In recent years, the method of preparing PPy thin films with multi-level structures by template replication has attracted widespread attention, and it has received more and more attention because of its simple operation, easy large-area preparation and certain controllability. Contents of the invention [0003] A...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C08J7/04C08J5/18C08L79/04C08L83/04
CPCC08J5/18C08J7/0427C08J2383/04C08J2479/04
Inventor 鲁从华杨成枫
Owner TIANJIN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products