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Plasma etching and cleaning technology for PVD coating

An ion etching and process technology, applied in metal material coating process, coating, ion implantation plating, etc., can solve the problems of substances that cannot remove chemical binding force, cannot clean the surface of raw materials, etc., to improve various performances , high production efficiency, the effect of improving the bonding force

Inactive Publication Date: 2018-10-16
PVT COATING CHANGZHOU
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The problem with this process is that its etching cleaning is a physical cleaning, which cannot remove the chemically binding substances on the surface of the raw material layer, so this process cannot completely clean the surface of the raw material.

Method used

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  • Plasma etching and cleaning technology for PVD coating
  • Plasma etching and cleaning technology for PVD coating
  • Plasma etching and cleaning technology for PVD coating

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] A kind of PVD coating is used ion etching cleaning process, and this process comprises the steps:

[0029] a) Clamp the workpiece that needs to be PVD coated and etched and cleaned on the trolley, push it into the reaction furnace chamber and then evacuate it;

[0030] b) The vacuum degree in the reaction furnace chamber reaches 5×10 -2 After mbar, start to heat up to 450°C;

[0031] c) After the indoor temperature of the reaction furnace reaches the condition, feed the reaction gas, control the gas flow and time, adjust the parameters of the bias power supply, metal target and evaporation source power supply, generate plasma, and perform ion etching cleaning on the workpiece substrate, PVD coating can be performed after the ion etching cleaning is completed. figure 1Shown is a schematic structural diagram of a workpiece plasma etching device. In the figure, the device includes: a reaction furnace chamber 1, a metal target 2 symmetrically arranged on the inner wall of...

Embodiment 2

[0040] A kind of PVD coating is used ion etching cleaning process, and this process comprises the steps:

[0041] a) Clamp the workpiece that needs to be PVD coated and etched and cleaned on the trolley, push it into the reaction furnace chamber and then evacuate it;

[0042] b) The vacuum degree in the reaction furnace chamber reaches 5×10 -3 After mbar, start to heat up to 480°C;

[0043] c) After the indoor temperature of the reaction furnace reaches the condition, feed the reaction gas, control the gas flow and time, adjust the parameters of the bias power supply, metal target and evaporation source power supply, generate plasma, and perform ion etching cleaning on the workpiece substrate, PVD coating can be performed after the ion etching cleaning is completed.

[0044] Further, in the step (c) described in the above-mentioned technical scheme, feed reaction gas, control gas flow and time specifically:

[0045] 1) Ar flow rate 90sccm, bias voltage setting 450V, Uarc=40...

Embodiment 3

[0051] A kind of PVD coating is used ion etching cleaning process, and this process comprises the steps:

[0052] a) Clamp the workpiece that needs to be PVD coated and etched and cleaned on the trolley, push it into the reaction furnace chamber and then evacuate it;

[0053] b) Wait until the vacuum degree in the reaction furnace reaches 1.5×10 -3 After mbar, start to heat up to 450°C;

[0054] c) After the indoor temperature of the reaction furnace reaches the condition, feed the reaction gas, control the gas flow and time, adjust the parameters of the bias power supply, metal target and evaporation source power supply, generate plasma, and perform ion etching cleaning on the workpiece substrate, PVD coating can be performed after the ion etching cleaning is completed.

[0055] Further, in the step (c) described in the above-mentioned technical scheme, feed reaction gas, control gas flow and time specifically:

[0056] 1) Ar flow rate 100sccm, bias voltage setting 400V, U...

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Abstract

The invention relates to a plasma etching and cleaning technology in a PVD coating production and manufacture process. The plasma etching and cleaning technology mainly takes a mixture of inert gas and non-inert gas at various combinations as reactant gas, generated plasmas can achieve functions of physical ion cleaning and chemical ion cleaning simultaneously, so that residues, such as oxides, oil and microparticles, sucked to the surface of a workpiece, as well as metallic oxides on the surface of the workpiece are removed, surface energy of the workpiece is activated, the production efficiency is relatively high, and finally the binding force of a PVD coating and a workpiece substrate is improved. In addition, the PVD coating is more uniform, various properties of the PVD coating are improved, the service life of the workpiece is prolonged, and the plasma etching and cleaning technology is suitable for further popularization and application.

Description

technical field [0001] The invention relates to the field of PVD coating production technology, in particular to a plasma etching and cleaning process in the PVD coating production process. Background technique [0002] PVD coating technology appeared in the late 1970s. Due to the low processing temperature of the process, it can be controlled below 500 °C and will not affect the hardness of the matrix of some workpiece materials. Therefore, it can be used as high-speed steel and cemented carbide tools, The final treatment process of the mold. Without affecting the original size of the workpiece, PVD coating can be used to improve the surface appearance of the workpiece, increase the surface hardness of the workpiece and increase wear resistance, and PVD coating has good thermal conductivity, corrosion resistance and oxidation resistance . Therefore, this technology has been rapidly promoted since the 1980s. By the end of the 1980s, the PVD coating of high-speed steel tool...

Claims

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Application Information

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IPC IPC(8): C23C14/02
Inventor 王信德潘修河
Owner PVT COATING CHANGZHOU
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