Preparation method of on-chip high-quality thin film micro-optical structure

A micro-optic, high-quality technology, applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc., to overcome the difficulties in the coupling region, improve efficiency, and reduce the effective mode volume

Active Publication Date: 2018-11-06
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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  • Abstract
  • Description
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  • Application Information

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Problems solved by technology

However, traditional chemical mechanical polishing is used to prepare flat material surfaces, rather than to improve the overall quality of on-chip thin film structures.

Method used

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  • Preparation method of on-chip high-quality thin film micro-optical structure
  • Preparation method of on-chip high-quality thin film micro-optical structure

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Embodiment Construction

[0030] The present invention will be further described below by examples and accompanying drawings, but the protection scope of the present invention should not be limited by this.

[0031] see first figure 1 , figure 1 It is a schematic flow chart of the method for preparing an on-chip optical whispering gallery mode microcavity by using femtosecond laser combined with chemical mechanical polishing. The method of the present invention is now illustrated by taking the on-chip lithium niobate single crystal thin film as an example. It can be seen from the figure that the present invention uses femtosecond The method for preparing an on-chip optical whispering gallery mode microcavity by combining laser with chemical mechanical polishing includes the following five steps:

[0032] (1) Plating Cr metal film on the surface: Take an on-chip single crystal lithium niobate film sample 6 with a size of 3mm×4mm×1mm, which consists of a substrate 7 with a thickness of about 1mm, SiO 2...

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Abstract

The invention relates to a preparation method of an on-chip high-quality thin film micro-optical structure, comprising the steps of plating a metal layer on the surface of a thin film, carrying out femtosecond laser selective ablation on a metal film, carrying out chemical mechanical polishing and carrying out chemical corrosion. The on-chip micro-optical device prepared by adopting the method provided by the invention has extremely high surface finish and extremely low optical loss. The method is applicable to preparation of high-quality micro-optical structures (including but not limited toa micro disk cavity, a microring cavity, an optical waveguide and coupled devices thereof) on all kinds of on-chip thin films (including but not limited to a lithium niobate single crystal thin film,a quartz thin film, a silicon thin film, a silicon dioxide thin film, a diamond thin film and the like).

Description

technical field [0001] The invention relates to femtosecond laser processing and chemical mechanical polishing, in particular to a method for preparing on-chip microstructures (including microcavity discs, microrings, optical waveguides and their integrated structures) by using femtosecond laser processing combined with chemical mechanical polishing. This method is applicable to various on-chip thin film materials, including but not limited to lithium niobate single crystal thin film, quartz thin film, silicon thin film, silicon dioxide thin film, diamond thin film and the like. Background technique [0002] Micro-optical devices refer to micro-structured optical devices with a structure size above the submicron level and a surface roughness up to the nanometer level. On-chip micro-optical devices generally significantly increase the interaction between light and matter by localizing the light field in space and even in time. In basic research and engineering applications, s...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/263H01L21/306
CPCH01L21/2633H01L21/30625
Inventor 程亚伍荣波张健皓乔玲玲林锦添
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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