Developing device and circuit board manufacturing method
A manufacturing method and circuit substrate technology, applied to photosensitive materials used in optomechanical equipment, processing of photosensitive materials, etc., can solve problems such as retention of developer solution, insufficient development, and reduced replacement efficiency of developer solution, so as to prevent uneven development Effect
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Embodiment 1
[0122] In a three-necked flask equipped with a stirring device and a thermometer, 60 g of a binder polymer (TR-2500 manufactured by Negami Kogyo Co., Ltd.) and 100 g of diethylene glycol monobutyl ether acetate after vacuum drying at 50° C. for 48 hours were weighed. Heat and dissolve at 60°C. Cool the flask to 30°C, add 5g of isooctyl acrylate, 25g of dipentaerythritol hexaacrylate, and 1,6-hexanediol bis[(3,5-di-tert-butyl-4-hydroxyphenyl)propionate] 0.1 g, 5 g of 1-hydroxycyclohexyl phenyl ketone, and 2 g of a dispersant (manufactured by Kyoeisha Chemical Co., Ltd., "Flowlen (registered trademark)" G-700DMEA) were stirred for 2 hours. 120 g of the obtained organic component and the average particle size of 1.19 μm and the specific surface area of 1.12 m produced by the wet reduction method 2 / g, tap density is 4.8g / cm 3 The Ag powder was kneaded with a three-roll mill to obtain a negative photosensitive resin composition.
[0123] This negative photosensitive resin com...
Embodiment 2
[0126] In Example 1, the conveyance speed was set to 7.5 m / min, and the conditions other than that were similar to Example 1, and the preparation of the conductive pattern was performed.
Embodiment 3
[0128] In Example 1, the conveyance speed was set to 0.2 m / min, and the conditions other than that were carried out similarly to Example 1, and preparation of the conductive pattern was performed.
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