Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Pretreatment device of sample for measuring secondary electron emission characteristic of material

A technology for secondary electron emission and sample pretreatment, which is applied in measuring devices, analyzing materials, and using wave/particle radiation for material analysis, etc., and can solve problems such as insufficient temperature and secondary pollution

Pending Publication Date: 2018-11-27
INST OF FLUID PHYSICS CHINA ACAD OF ENG PHYSICS
View PDF0 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Aiming at the problem of insufficient temperature or secondary pollution after surface pretreatment of the material used for the measurement of secondary electron emission characteristics in the above-mentioned prior art, the present invention provides a material secondary electron Sample pretreatment device for measurement of emission characteristics. This pretreatment device can not only effectively eliminate the influence of adsorbed gas and volatile organic pollutants on the surface of the sample on the measurement of secondary electron emission characteristics of the material, but also its structural design can effectively prevent the sample from being transferred from the pretreatment chamber. Secondary pollution on the way to the measuring chamber

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Pretreatment device of sample for measuring secondary electron emission characteristic of material
  • Pretreatment device of sample for measuring secondary electron emission characteristic of material
  • Pretreatment device of sample for measuring secondary electron emission characteristic of material

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0039] Such as Figure 1 to Figure 6 As shown, a sample pretreatment device for measuring secondary electron emission characteristics of materials includes a vacuum chamber 14 with a closed space and a vacuum pump 25 connected to the closed space, and also includes a heating device. The heating device includes a barrel-shaped The bottom bucket 10 and the gland 4 as the opening end sealing plate of the bottom bucket 10, the heating device is located in the closed space;

[0040] It also includes a driving part 22 installed on the vacuum chamber 14, the driving part 22 is connected with the gland 4 through the motion transmission part 2, and the driving part 22 is used to drive the gland 4 along the direction of the opening end of the bottom barrel 10. sports;

[0041] It also includes a sample storage platform 5 installed on the gland 4. When the gland 4 is fastened to the open end of the bottom bucket 10, the sample storage platform 5 is located in the bottom bucket 10 and th...

Embodiment 2

[0052] Such as Figure 1 to Figure 6 As shown, this embodiment is further limited on the basis of Embodiment 1: Since the measured samples may have problems of inconsistent volume, shape and size, in order to make the pretreatment device have better adaptability and be able to complete multiple samples at the same time The pretreatment is set as follows: the sample storage platform 5 has a columnar structure, and a plurality of slots are arranged on the side of the sample storage platform 5 . With this solution, multiple slots can be matched with multiple sample trays 6, that is, by inserting the sample tray 6 into the slot, the sample is fixed on the sample tray 6, so that the volume and shape of the sample do not affect the sample storage. The way of installing on the platform 5 improves the adaptability of the pretreatment device to samples; it is set to have multiple slots, so that multiple slots cooperate with multiple sample trays 6, so that multiple samples can be fixed...

Embodiment 3

[0062]This embodiment provides a specific implementation method of a sample pretreatment device for measuring secondary electron emission characteristics of materials. There is a vacuum moving platform connected to the top of the outer periphery of the vacuum chamber 14, and the vacuum moving platform is the driving part 22. The middle part There is a gate valve for the gate part 24 and a molecular pump for the vacuum pump 25 on the opposite side of the magnetic rod for grabbing the transfer part 23. The bottom of the vacuum chamber 14 is connected with an air release valve 21 and a heating control power supply. The power terminal block 20 at the introduction point; the vacuum moving platform is set on the upper part of the vacuum cavity 14, the output end of the vacuum moving platform is located at the lower end, the sample storage table 5 and the gland 4 are connected on the lower end of the vacuum moving platform, and the bottom barrel 10 is located at the gland 4 directly b...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a pretreatment device of a sample for measuring the secondary electron emission characteristic of a material, which comprises a vacuum cavity and a vacuum pump, and also comprises a heating device, wherein the heating device comprises a bottom barrel and a gland; a driving part, wherein the driving part is used for driving the gland to move in the direction of the opening end of the bottom barrel; a sample storage platform, wherein the sample storage platform is positioned in the space enclosed by both the bottom barrel and the gland when the gland is buckled on the opening end of the bottom barrel; a grabbing and transferring part and a gate part, wherein the gate part is used as a passage outside the closed space and vacuum cavity; the heating device is used for heating the space enclosed by both the bottom barrel and the gland. The pretreatment device not only can effectively eliminate the influence of the sample surface adsorption gas and volatile organic contaminants on the measurement of the secondary electron emission characteristic of the material, and meanwhile, the structure design can effectively prevent secondary pollution when the sample is transferred from the pretreatment cavity to the measuring cavity.

Description

technical field [0001] The invention relates to the technical field of vacuum baking equipment, in particular to a sample pretreatment device for measuring secondary electron emission characteristics of materials. Background technique [0002] When an electron beam with a certain energy bombards a solid material, electrons will be emitted from the surface of the material. This phenomenon is called the secondary electron emission phenomenon of solid materials. The ratio of the number of secondary electrons emitted by the material surface to the initial incident electrons is called the secondary electron emission coefficient, which is a characteristic surface parameter of the material. The secondary electron emission coefficient of the material surface and the energy spectrum distribution of the emitted secondary electrons are not only related to factors such as material type, incident electron energy, and electron incident angle, but also affected by the surface state of the ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G01N23/2202
CPCG01N23/2202G01N23/225
Inventor 何佳龙龙继东彭宇飞李杰杨振刘平王韬李喜董攀蓝朝晖郑乐刘尔祥赵伟杨洁石金水
Owner INST OF FLUID PHYSICS CHINA ACAD OF ENG PHYSICS
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com