ITO plane target blank low oxygen inhibition gel injection molding method and mold

A technology of gel injection molding and flat target, which is applied in ceramic molding machines, manufacturing tools, etc., can solve the problems of peeling on the surface of the green body and easy deformation of the green body, and achieve the effect of preventing peeling on the surface.

Inactive Publication Date: 2018-12-07
725TH RES INST OF CHINA SHIPBUILDING INDAL CORP
View PDF6 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] The technical problem to be solved by the present invention is to overcome the defects that the surface of the green body is prone to peeling due to oxygen inhibition and deformation of the green body when the flat target body is prepared by gel injection molding, and to provide an ITO planar target body Bulk low oxygen inhibition gel injection molding method and mold

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • ITO plane target blank low oxygen inhibition gel injection molding method and mold

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0036] ITO planar target body low oxygen inhibition gel injection molding method, the steps are as follows:

[0037] The prepared ITO planar target blank has a specification of 400×500×11mm, and the corresponding assembled molding mold has a cavity specification that matches the size of the blank.

[0038] According to the target solid phase content of 85%, the polycarboxylic acid dispersant containing 1.4% (relative to the mass fraction of the powder, the same below), 3.35% MAM, 0.4% MBAM and 17.6% H 2 O mix and stir to make a master mix. Take the ITO powder (SnO 2 containing 10%) was mixed with the premix, and mechanically milled for 15 hours to prepare an ITO slurry with a solid content of 85% and a viscosity of 391 mPa·s. After ball milling, add 0.55‰APS and 0.08‰TEMED to the slurry, mix well, and transfer to the slurry storage tank.

[0039] After the slurry is vacuumed and defoamed in the slurry storage tank, start the "slurry feed" button of the control cabinet, and ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses an ITO plane target blank low oxygen inhibition gel injection molding method and mold. The method comprises the following steps that the height direction of a mold cavity corresponds to the length or width direction of a plane target blank; ITO composite powder, water, organic monomer and an auxiliary agent are mixed to prepare slurry, then the slurry is injected into a cavity of the mold, then, a sealing agent with the density smaller than that of water is injected into the cavity firstly to enable a layer of floating sealing layer to be formed above the slurry, and then heating is carried out to enable the slurry to be solidified. During molding, the maximum surface of the blank is tightly attached to the mold, and is prevented from being in contact with air, theside surface, with the smaller area, of the blank is located at the upper end, moreover, oxygen in the air is blocked by using a small quantity of the sealing agent with the density lower than that ofwater, and then the situation that surface peeling of the ITO blank happens due to oxygen inhibition can be prevented in the gel solidifying process; due to the fact that in the gel solidifying process, the water-evaporation free surface of the blank is only limited to the side surface, with the smaller area, of the blank, the two opposite maximum surfaces of the blank are limited in the originalposition, and the problem of warping deformation is not likely to occur when the gel is solidified.

Description

technical field [0001] The invention relates to a molding process of an ITO planar target blank, in particular to a low-oxygen polymerization-inhibiting gel injection molding method and a mold for an ITO planar target blank. Background technique [0002] ITO is the abbreviation of Tin-doped Indium Oxide. The meaning of ITO refers to an indium tin oxide material. The ITO body is a body made of indium tin oxide. [0003] At present, the ITO target blank forming technology is divided into two types: dry method and wet method. The dry method generally adopts the method of first molding and then cold isostatic pressing (CIP); the wet method generally adopts the method of grouting. The ITO target can be prepared by sintering the green body prepared by dry method or wet method under normal pressure or slightly positive pressure. [0004] When using post-molding CIP to form large-size target blanks, the process has limitations, such as uneven density of the blank, low yield, poor ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): B28B1/14B28B7/24C04B35/457
CPCB28B1/14B28B7/24C04B35/457
Inventor 杨硕李龙腾孙冰师琳璞
Owner 725TH RES INST OF CHINA SHIPBUILDING INDAL CORP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap