Snapshot-type full-field white light interference microscopic measurement method and device

A technology of white light interference and microscopic measurement, which is applied in the direction of measuring devices, optical devices, instruments, etc., can solve the problems of limited single horizontal measurement range, difficulty in full-field and single-frame measurement, and increase the horizontal measurable range , Improve the controllability and anti-interference ability, and suppress the effect of measurement error

Active Publication Date: 2018-12-11
SUZHOU UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, due to the use of traditional slit-type spectrometers, CCSI has a limited range of single lateral measurements
Although the Lateral Dispersion Spectral Encoded Interferometer (LCDSEI) proposed by M. Gronle et al. of the center has improved the detection efficiency through lateral line measurement, it is still difficult to measure the whole field and single frame

Method used

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  • Snapshot-type full-field white light interference microscopic measurement method and device
  • Snapshot-type full-field white light interference microscopic measurement method and device
  • Snapshot-type full-field white light interference microscopic measurement method and device

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Embodiment 1

[0032] See attached figure 1 , which is a schematic diagram of the structure of the snap-shot full-field white light interference microscopic measurement device provided in this embodiment. The measurement device consists of a wide-spectrum light source 1, a collimated beam-expanding lens 2, a beam splitter 3, an axial dispersion type interference microscope objective lens 4, a stage 6, an imaging coupling lens 7, and a snapshot spectral imaging detector 8 , Data transmission control line 9 and computer 10 form.

[0033] The computer 10 is connected to the snapshot spectral imaging detector 8 via the data transmission control line 9; the measured element 5 is placed on the stage 6, and the respective positions of the measured element 5 and the wide-spectrum light source 1 are at the central wavelength of the spectral range used for measurement Satisfies the conjugate relationship of the object and image; the collimated beam expander and uniform light lens 2, the beam splitter...

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Abstract

The invention discloses a snapshot-type full-field white light interference microscopic measurement method and device. On the basis of a white light interference microscopic measurement method and a snapshot-type spectral imaging detection technology, compound color parallel light passes through an axial dispersion-type interference optical system to be sequentially dispersed axially, the dispersed light is correspondingly focused at different axial depth positions, and the intensity of a white light interference signal in the spectrum domain changes with the wavelength, and reaches a maximumvalue nearby one monochromatic focal plane of the axial dispersion; the unique coding among the white light interference signal, spectrum and depth required by the measurement is built, and only multi-frame or single-frame snapshot-type dispersion spectrum coding white light interference image is required for achieving the non-mechanical scanning, full-field non-contact and quick (dynamic and eveninstant) high-precision measurement of the three-dimensional shape distribution of a detected part.

Description

technical field [0001] The invention relates to a measurement technology of microstructure topography, in particular to a snapshot type full-field white light interference microscopic measurement method and a device thereof, which belong to the field of advanced manufacturing and detection technology. Background technique [0002] Microelectromechanical systems (MEMS) and diffractive optical elements (DOE) are widely used in industrial production, national defense and military, medical and health services, and life services. The complex microstructure existing on the surface of these components is closely related to the intrinsic characteristics of the components such as residual stress, service life, and damage threshold. The ultra-precise detection of its microstructure morphology can provide guidance and help for the pre-evaluation and control of component-related performance. Therefore, more and more people pay attention to the research on related detection systems and ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01B11/24G01B9/02G01B9/04
CPCG01B9/02G01B9/04G01B11/2441
Inventor 马锁冬王钦华曾春梅许峰
Owner SUZHOU UNIV
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