LED epitaxial structure and preparation method thereof
An epitaxial structure and superlattice technology, which is applied in the direction of electrical components, circuits, semiconductor devices, etc., can solve the problems of LED luminous efficiency decline, achieve the effect of reducing the conduction band energy level drop and reducing non-radiative recombination
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[0037] The present invention will be described in detail below in conjunction with specific embodiments shown in the accompanying drawings. However, these embodiments do not limit the present invention, and any structural, method, or functional changes made by those skilled in the art according to these embodiments are included in the protection scope of the present invention.
[0038] Such as figure 1 As shown, it is a schematic diagram of an LED epitaxial structure 100 according to an embodiment of the present invention.
[0039] The LED epitaxial structure 100 includes a substrate 10, an AlN buffer layer 20, a uGaN layer 30, an N-type GaN layer 40, a multi-quantum well light-emitting layer 50, an AlInGaN / AlN superlattice diffusion barrier layer 60, and a P-type hole layer from bottom to top. injection layer 70 and P-type GaN layer 80 .
[0040] The substrate 10 can be made of sapphire material, of course, in other implementation manners, the substrate 10 can also be made ...
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