Quantum dot light emitting device
A technology of quantum dot luminescence and components, which is applied in the direction of electrical components, electrical solid devices, semiconductor devices, etc., and can solve problems such as easy agglomeration, uneven particle size and roughness of zinc oxide
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Embodiment 1
[0063] The ITO substrate is cleaned, PEDOT:PSS (CAS: 155090-83-8) is printed on the ITO electrode layer, and then dried by a vacuum low pressure hot plate to form a hole injection layer with a thickness of 35nm, and then PVK material (CAS) is printed on the hole injection layer. :25067-59-8) and use the vacuum low pressure hot plate to heat and dry the formed hole transport layer, print the quantum dot material (composition CdSe / CdS / ZnS) on the hole transport layer and use the vacuum low pressure heat press A 5nm light-emitting layer was formed by drying, E-4 was vapor-deposited on the light-emitting layer to form a 40-nm electron transport layer, then 0.5-nm LiF was vapor-deposited, and finally silver was vapor-deposited to form a 100-nm electrode layer, and the light-emitting element was packaged and formed.
[0064] The positive electrode of the prepared light-emitting element was an ITO electrode and the negative electrode was a silver electrode, and the driving voltage was te...
Embodiment 2
[0067] The ITO substrate is cleaned, PEDOT:PSS (CAS: 155090-83-8) is printed on the ITO electrode layer, and then dried by a vacuum low pressure hot plate to form a hole injection layer with a thickness of 35nm, and then PVK material (CAS) is printed on the hole injection layer. :25067-59-8) and use the vacuum low pressure hot plate to heat and dry the formed hole transport layer, print the quantum dot material (composition CdSe / CdS / ZnS) on the hole transport layer and use the vacuum low pressure heat press A 5nm light-emitting layer was formed by drying, E-33 was vapor-deposited on the light-emitting layer to form a 40-nm electron transport layer, then 0.5-nm LiF was vapor-deposited, and finally silver was vapor-deposited to form a 100-nm electrode layer, and the light-emitting element was packaged.
[0068] The positive electrode of the prepared light-emitting element is an ITO electrode, and the negative electrode is a silver electrode. A digital source meter (DigitalSource met...
Embodiment 3
[0071] The ITO substrate is cleaned, PEDOT:PSS (CAS: 155090-83-8) is printed on the ITO electrode layer, and then dried by a vacuum low pressure hot plate to form a hole injection layer with a thickness of 35nm, and then PVK material (CAS) is printed on the hole injection layer. :25067-59-8) and use the vacuum low pressure hot plate to heat and dry the formed hole transport layer, print the quantum dot material (composition CdSe / CdS / ZnS) on the hole transport layer and use the vacuum low pressure heat press A 5nm light-emitting layer was formed by drying, E-20 was vapor-deposited on the light-emitting layer to form a 40-nm electron transport layer, then 0.5-nm LiF was vapor-deposited, and finally silver was vapor-deposited to form a 100-nm electrode layer, and the light-emitting element was packaged.
[0072] The positive electrode of the prepared light-emitting element is an ITO electrode, and the negative electrode is a silver electrode. A digital source meter (DigitalSource met...
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