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Substrate support device, exposure device, and patterning device

A technology of supporting device and substrate, which is applied in the direction of exposure device of photoengraving process, exposure equipment of microlithography, optics, etc.

Active Publication Date: 2021-06-11
NIKON CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, it is difficult to measure changes in various accuracies (positioning accuracy, coincidence accuracy, focus accuracy, connection accuracy, etc.) in a timely manner through test exposure (and development)

Method used

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  • Substrate support device, exposure device, and patterning device
  • Substrate support device, exposure device, and patterning device
  • Substrate support device, exposure device, and patterning device

Examples

Experimental program
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Embodiment Construction

[0036] Hereinafter, a substrate supporting device, an exposure device, and a patterning device according to aspects of the present invention will be described in detail with reference to the attached drawings, and preferred embodiments will be disclosed. In addition, the aspects of the present invention are not limited to these embodiments, and various changes and improvements are also included. That is, the constituent elements described below include those that can be easily conceived by those skilled in the art to which the invention pertains and those that are substantially the same, and the constituent elements described below can be appropriately combined. In addition, various omissions, substitutions, or changes of components can be made without departing from the scope of the present invention.

[0037] figure 1 The figure which shows the overall structure of the substrate processing apparatus (pattern exposure apparatus) of a roll-to-roll system. use figure 1 The p...

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Abstract

The present invention is a rotating drum (DR) that winds and supports a part of a flexible elongated sheet substrate (P) along the circumferential direction of a cylindrical outer peripheral surface, including: a cylindrical body (50), It has a cylindrical outer peripheral surface with a fixed radius from the central axis (AXo); a photoelectric sensor (PDi), whose output is projected toward the outer peripheral surface of the cylinder (50) and injected into the outer peripheral surface formed on the cylindrical body ( 50) part of the outer peripheral surface of the opening (50 n ) signal corresponding to the intensity of the light beam (LBn); and a sensor circuit substrate (60), which inputs a signal from the photoelectric sensor (PDi) to measure the intensity change or beam position of the light beam (LBn) signal processing.

Description

technical field [0001] The present invention relates to a substrate supporting device that supports a flexible substrate in a roll-to-roll manner or in a single-piece manner, and an exposure device and a patterning device that perform exposure processing on a substrate supported by the substrate supporting device . Background technique [0002] Japanese Patent Laid-Open No. 2006-098719 discloses a roll-to-roll exposure apparatus (substrate processing apparatus). Specifically, the drum is rotated in a state where the flexible printed wiring board material (hereinafter, simply referred to as the flexible substrate) sent from the supply reel is in close contact with the outer peripheral surface of the drum. Then, the light beam from the exposure head unit equipped with digital micromirror device (DMD) and microlens array controlled according to the image data is projected onto the surface of the flexible substrate supported by the roller to expose the wiring image (pattern) ....

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/24G03F7/20H01L21/68
CPCG03F7/20G03F7/24H01L21/68G03F7/70775G03F7/7085G03F9/7046
Inventor 加藤正纪鬼头义昭堀正和木内徹仓重贵广
Owner NIKON CORP