Unlock instant, AI-driven research and patent intelligence for your innovation.

Method for establishing elastoplastic contact correction model of multi-scale coupling double sinusoidal waveform surface

A technology for correcting models and establishing methods, applied in 3D modeling, image data processing, special data processing applications, etc., to avoid immature convergence and facilitate digital modeling and representation

Inactive Publication Date: 2019-01-11
NORTH CHINA UNIV OF WATER RESOURCES & ELECTRIC POWER
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to focus on solving the modeling problem of the coupling of macroscopic structural parameters and microscopic contact surface topography parameters of arcuate surfaces, and to provide a method for establishing an elastoplastic contact correction model for multi-scale coupled double sine wave surfaces

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for establishing elastoplastic contact correction model of multi-scale coupling double sinusoidal waveform surface
  • Method for establishing elastoplastic contact correction model of multi-scale coupling double sinusoidal waveform surface
  • Method for establishing elastoplastic contact correction model of multi-scale coupling double sinusoidal waveform surface

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0037] Specific embodiments of the present invention will be described in detail below. It should be understood that the specific embodiments described here are only used to illustrate and explain the present invention, and are not intended to limit the present invention.

[0038] see Figure 1 to Figure 12 . The multi-scale coupled arc surface rough surface modeling method specifically includes the following steps:

[0039] (1) see figure 2 , according to the geometric characteristics of the contact surface studied, determine the projection area of ​​the contact surface on the horizontal plane xoy, denoted as area D; define the coordinates of any point P in the projection area D as (x, y), where x∈[a,b], y ∈[c,d],L x , L y are the side lengths of the projection area D in the x-axis direction and the y-axis direction respectively, then there is L x =b-a,L y =c-d; D=x×y={(x,y):a≤x≤b, c≤y≤d}.

[0040] (2) see figure 2 , with Δx R , Δy R As the step size, the side le...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a method for establishing an elastoplastic contact correction model of a multi-scale coupling double sinusoidal waveform surface, which can be used for generating a more efficient and accurate elastoplastic contact analysis model. By dividing the projection plane of the contact area into grids of different scales with different step lengths, grid intersection coordinates are determined; based on the smooth continuity and periodicity of double sinusoidal waveforms, the macroscopic matrix height and the amplitude of the double sinusoidal wavefront are controlled by a large-scale mesh, small-scale grids control the smooth continuity of two sinusoidal surfaces, and a height matrix of the rough surface is generated; by using digital programming and cloud processing technology, a three-dimensional solid model and contact plane of a rough surface are generated in finite element software, and nonlinear material properties are defined, mesh division is performed, and contact parameters and boundary conditions are defined; an elasto-plastic contact correction model of a multi-scale coupling double sinusoidal wave surface is generated, and the method provides an effective way for the study of multi-scale coupled contact problem.

Description

technical field [0001] The invention relates to a method for modeling a joint surface contact model, in particular to a method for establishing an elastic-plastic contact correction model for a multi-scale coupled double sine wave surface, which can be used for research on rough surface contact problems. Background technique [0002] Real contact surfaces are rough at the microscopic scale, and the interaction of surfaces during contact is crucial to the contact and tribological properties of typical mechanical parts such as gears, bearings, clutches, and wheel rails. Contact characteristics such as contact stress, contact area, and normal deformation play a key role in the friction, wear, lubrication, sealing, and heat conduction of mechanical equipment and parts. [0003] The contact problem is highly nonlinear, and its analysis model has many difficulties to be solved in theory and algorithm. Scholars at home and abroad have carried out a lot of research on the character...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G06T17/20G06F17/50
CPCG06F30/23G06T17/20
Inventor 刘楷安李秋菊
Owner NORTH CHINA UNIV OF WATER RESOURCES & ELECTRIC POWER
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com