Micronano-scale high-temperature laser impact imprinting device and method

Abstract

The invention discloses a micronano-scale high-temperature laser impact imprinting device and method, and relates to the technical field of laser impact imprinting. The device comprises an atmosphereprotection module, a high-temperature laser impact imprinting module, a monitoring module and a clamp module; the atmosphere protection module comprises a target chamber, the target chamber is provided with an air inlet and an air outlet, and the air inlet is sequentially connected with an air inlet valve, an air pump and an air storage system through pipelines; the air outlet is connected with anoxygen sensor and an exhaust valve through pipelines; the oxygen sensor is connected with the air pump; the high-temperature laser impact imprinting module is formed by connecting a focus lens, a pulse laser device, a pulse laser controller, a pulse delay generator, an infrared laser controller and an infrared laser device in sequence; the monitoring module is formed by sequentially connecting aCCD and a computer; the clamp module is composed of a constraint layer, an absorption layer, a sample and a mold from top to bottom in sequence; the clamp module is arranged in the target chamber. Laser impact imprinting and rapid manufacturing of a high-precision micronano complex structure on the surface of a metal material are achieved.

Description

technical field [0001] The invention relates to the technical field of laser shock imprinting, in particular to a micro-nano scale high-temperature laser shock imprinting device and method. Background technique [0002] With the rapid development of micro-electromechanical systems, nano-electromechanical systems, and microfluidic chips, higher and higher requirements are placed on the miniaturization and high precision of devices. In the manufacture of micro-devices based on metal materials, how to obtain complex structures at the micro-nano scale on the surface of the material is a relatively big challenge. Laser shock imprinting technology uses high-energy shock waves generated by laser ablation of the absorbing layer to act on the surface of metal materials. Under the action of shock waves, metal materials produce superplastic deformation, which can quickly replicate micro-nano complex structures. However, in the process of laser shock imprinting, there are still two pro...

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Problems solved by technology

However, in the process of laser shock imprinting, there are still two problems: first, when laser shock imprinting is performed at room temperature or at a higher temperature (below the recrystallization temperature of the metal material), the obtained metal material The depth-width ratio of the micro-nano structure is small, and the replication accuracy is poor. When the laser focus energy is further increased, the material will be cracked due to a large impact force; secondly, if the laser shock imprinted If the temperature is raised above the recrystallization temperature, although the forming accuracy of the micro-nano structure can be improved, the performance of the micro-nano device will be greatly reduced due to the high-temperature oxidation of the surface of the metal material and the grain growth of the material.

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